Carbide, Nitride and Boride Materials Synthesis and Processing 1997
DOI: 10.1007/978-94-009-0071-4_22
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Chemical Vapor Deposition (CVD) and Infiltration (CVI)

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Cited by 3 publications
(1 citation statement)
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“…CVD/CVI involves exposing a heated substrate to one or more volatile precursors (e.g., organosilica) that react or decompose on the substrate surface (or on the pore walls) to deposit the desired thin film [56,57]. CVD/CVI is a versatile process for manufacturing coatings/films, fibers, powders, and monolithic components [58].…”
Section: Chemical Vapor Deposition/infiltration Routementioning
confidence: 99%
“…CVD/CVI involves exposing a heated substrate to one or more volatile precursors (e.g., organosilica) that react or decompose on the substrate surface (or on the pore walls) to deposit the desired thin film [56,57]. CVD/CVI is a versatile process for manufacturing coatings/films, fibers, powders, and monolithic components [58].…”
Section: Chemical Vapor Deposition/infiltration Routementioning
confidence: 99%