Chemical vapor deposition and morphology problems

Cauliflower-like protrusions formed in CVD processes under diffusion-limited conditions have been studied both experimentally and theoretically. Both approaches indicate that the difference in diffusion fluxes to the film and to the protrusions controls the growth of such protrusions. However, direct comparisons of these two approaches have never been done, probably due to the complexity of the theoretical models. To simplify model protrusion growth, we developed a one-dimensional (1D) analytical model by hypothesizing the diffusion of growth species in the boundary layer above a growing film. Based on this model, we propose a non-dimensional quantity, k s f/D, as an index of protrusion growth (D is the diffusion coefficient of the growth species, k s is the surface reaction-rate coefficient, and f is film thickness). This index represents more directly the protrusion growth than does the previously proposed index, the Damköhler number, Da = k s d/D, where d is boundary layer thickness. To obtain smooth, protrusion-free films, D/k s should be kept larger than the desired film thickness. By controlling the process conditions to satisfy this index, we successfully fabricated protrusion-free films with SiC deposition from dichlorodimethylsilane (DDS).

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Ablation of carbon-based materials: Investigation of roughness set-up from heterogeneous reactions

Duffa

Vignoles

Goyhénèche

et al. 2005

International Journal of Heat and Mass Transfer

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Chemical vapor deposition and morphology problems

Cited by 9 publications

References 20 publications

Model for the amorphous roughening transition in amorphous semiconductor deposition

Model for the amorphous roughening transition in amorphous semiconductor deposition

A Simple Index to Restrain Abnormal Protrusions in Films Fabricated Using CVD under Diffusion‐Limited Conditions

Ablation of carbon-based materials: Investigation of roughness set-up from heterogeneous reactions

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