2018
DOI: 10.1016/j.materresbull.2018.03.039
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Chemical bath deposition of single crystal SnS nanobelts on glass substrates

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Cited by 25 publications
(4 citation statements)
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“…SnS film possesses narrow band gap, when thickness was ≈20-30 nm, the corresponding band gap should be around 1.40 eV (≈886 nm) due to quantum confinement effect. [48,49] This value is consistent with the obtained optimum excitation wavelength of 900 nm.…”
Section: Resultssupporting
confidence: 91%
“…SnS film possesses narrow band gap, when thickness was ≈20-30 nm, the corresponding band gap should be around 1.40 eV (≈886 nm) due to quantum confinement effect. [48,49] This value is consistent with the obtained optimum excitation wavelength of 900 nm.…”
Section: Resultssupporting
confidence: 91%
“…Furthermore, the S precursor concentration can influence the morphology and phase formation of o-SnS films ( Figure 7 e). A higher TA concentration stimulates the formation of multi phases such as Sn 2 S 3 and Sn 3 S 4 (Sn 2 S 3 + SnS → Sn 3 S 4 ) [ 209 ] and a lower TA concentration assists the growth of single-phase o-SnS films, but with lower crystallinity [ 142 , 198 ]. A TA concentration of 0.1 M is preferable for the deposition of a single-phase, polycrystalline o-SnS with (101) preferred orientation [ 198 ], and a ST concentration of 0.75 M is advisable for (111)/(040) preferred orientation ( Figure 7 f).…”
Section: Influence Of Deposition Parameters On Sn X S Y Thin Film Growth and Propertiesmentioning
confidence: 99%
“…Furthermore, there is a dearth of information in the literature regarding Na doping of SnS films and the impact of concomitant surfactant properties on the conductivity and surface morphology of such cells deposited on a metallic substrate like copper. While there are several reports on the chemical bath synthesis of SnS using similar chemical reagents [ 17 , 18 , 19 , 20 , 21 , 22 , 23 ], detailed investigations on the influence of temperature, composition, and surfactants on the conductivity of the SnS layer are lacking.…”
Section: Introductionmentioning
confidence: 99%