Characterizing the remote plasma polymerization of octafluorocyclobutane induced by RF-driven hollow-cathode discharge

Ningel, Klaus-Peter; Theirich, D.; Engemann, J.

doi:10.1016/s0257-8972(97)00147-3

Cited by 13 publications

(12 citation statements)

References 16 publications

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“…Similarly, adding Ar gas into the deposition chamber was not found to have a significant effect on roughness or water contact angle behaviour. In all cases the water contact angle was found to be 111 , which is in good agreement with previously reported results [10]. Upon production of a Zisman plot, the critical solid surface tension of the CF x O y films was estimated as 9.3 mN/m, and it was generally found that the higher the surface tension of the liquid investigated, the higher the contact angle with the CF x O y film; although interestingly, polar molecules such as ethanol (35 ) and propan-2-ol (33 ) display remarkably low contact angles.…”

Section: Methodssupporting

confidence: 92%

“…Argyrakis et al [7] employed CF x O y thin films as an anti-adhesion and structure release aide. Grant et al [8,9] examined the growth and structure of CF x O y thin films as a function of the C 4 F 8 gas inlet feed position relative to the plasma zone, while Ningel et al [10] characterised CF x O y thin films deposited onto substrates up to 250 mm in length, reporting that the films exhibited excellent surface homogeneity.…”

Section: Introductionmentioning

confidence: 99%

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Characteristics and durability of fluoropolymer thin films

Cheneler

Bowen

Evans

et al. 2011

Polymer Degradation and Stability

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Keywords:Fluoropolymer Ellipsometry Atomic force microscopy X-ray photoelectron spectroscopy Wetting Solvent Etchant Aqueous solution pH Q1 a b s t r a c tThe use of plasma-polymerised fluoropolymer (CF x O y ) thin films in the manufacture of microelectromechanical systems (MEMS) devices is well-established, being employed in the passivation step of the deep reactive ion etching (DRIE) process, for example. This paper presents an investigation of the effect of exposure to organic and aqueous liquid media on plasma-polymerised CF x O y thin films. Atomic force microscopy (AFM), scanning electron microscopy (SEM), ellipsometry, X-ray photoelectron spectroscopy (XPS) and dynamic wetting measurements were all employed as characterisation techniques. Highly basic aqueous solutions, including known silicon etchants, were found to cause delamination via degradation of the countersurface below the CF x O y thin film. Films were found to be stable in organic solvents, acidic aqueous solutions and slightly basic aqueous solutions.

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Section: Methodssupporting

confidence: 92%

Section: Introductionmentioning

confidence: 99%

Characteristics and durability of fluoropolymer thin films

Cheneler

Bowen

Evans

et al. 2011

Polymer Degradation and Stability

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“…The corresponding peaks in the spectrum of PP-OFCB fall in a comparatively broad band at the region of 1100 to 1400 cm -1 , which is due to a convolution of CF x ( x = 1,2, or 3) stretching modes. The individual CF x peaks located within this broad convoluted band are difficult to assign unambiguously. − Two small broad peaks located at 740 and 1740 cm -1 can also be seen in the PP-OFCB spectrum. The former is caused by the vibrations from amorphous fluoro-materials, ,, CF−CF 3 vibration, and zone center CF 2 system stretching, , which implies a traditional polymer chain structure .…”

Section: Resultsmentioning

confidence: 99%

“…The individual CF x peaks located within this broad convoluted band are difficult to assign unambiguously. − Two small broad peaks located at 740 and 1740 cm -1 can also be seen in the PP-OFCB spectrum. The former is caused by the vibrations from amorphous fluoro-materials, ,, CF−CF 3 vibration, and zone center CF 2 system stretching, , which implies a traditional polymer chain structure . The latter is due to the vibrations of CCF 2 , −CCF 2 , and −CFCF 2 groups, , which signifies the existence of cross-linking structure in the film .…”

Section: Resultsmentioning

confidence: 99%

Plasma Polymerized Multi-Layered Photonic Films

et al. 2002

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A multilayer optical interference film has been developed using plasma-enhanced chemical vapor deposition (PECVD) of different organic precursor materials. A relatively large refractive index contrast for polymers (>0.2) is achieved by sequential plasma polymerization (PP) of octafluorocyclobutane (OFCB) and benzene. Gas-phase molecules of both precursors, excited by an argon plasma in a flowing afterglow reaction chamber, are deposited on a variety of substrates to form dense, pinhole-free, cross-linked polymer films. The PP-OFCB film yields a refractive index of 1.40, whereas PP-benzene exhibits a refractive index of 1.61 at 500 nm. We report here on the chemical (FTIR and XPS), optical (variable angle spectroscopic ellipsometry and UV-Vis spectrometry), and morphological (scanning electron microscopy) characterization of individually polymerized films of each component. These data are used to design a multilayer film with a notch at ∼1 µm. A ten-bilayer stack (alternating high and low refractive index) was fabricated by sequential deposition of high and low refractive index layers at approximately 1 / 4 λ optical thickness. Optical spectra of the experimental stack exhibit a notch wavelength within several nanometers of the design wavelength indicating good thickness control.

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“…The presence of these vibrations implies the existence of crosslinking. [38,39] A few small absorption bands emerge at 2850 and 2950 cm…”

mentioning

confidence: 99%

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

Jiang¹,

Eyink²,

Grant³

et al. 2008

Chemical Vapor Deposition

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Plasma copolymerization is utilized to fabricate thin photonic films based on hexamethyldisiloxane (HMDSO, C 6 H 18 Si 2 O) and octafluorocyclobutane (OFCB, C 4 F 8 ). The structure of the plasma copolymerized films is examined by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR), and the optical properties including refractive index, n, and extinction coefficient, k, are determined by spectroscopic ellipsometry. The refractive indices, which range from 1.38 to 1.54, can be manipulated by adjusting the volume ratio of the two monomers, HMDSO and OFCB, during the polymerization. A nonlinear relationship between the refractive index and extinction coefficient with comonomer feed ratio is observed. A strong initial increase in both n and k as the amount of HMDSO is increased is attributed to significant defluorination of the resultant polymer films coupled with the formation of a C-C rich crosslinked network. Once the network incorporates substantial amounts of Si-C and Si-O bonds, the refractive index starts to decrease slowly due to a lowering of the density. XPS and FTIR results confirm the changes in internal structure consistent with this mechanism.

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Characterizing the remote plasma polymerization of octafluorocyclobutane induced by RF-driven hollow-cathode discharge

Cited by 13 publications

References 16 publications

Characteristics and durability of fluoropolymer thin films

Characteristics and durability of fluoropolymer thin films

Plasma Polymerized Multi-Layered Photonic Films

PECVD Siloxane and Fluorine‐Based Copolymer Thin Films

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