Characterization of zirconium nitride coatings deposited by cathodic arc sputtering

Gruss, Kimberly Ann; Zheleva, T.; Davis, R.F.; Watkins, Thomas R.

doi:10.1016/s0257-8972(98)00584-2

Cited by 37 publications

(15 citation statements)

References 31 publications

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“…The hardness of arc evaporated ZrN is usually found in the range between 20 and 30 GPa. 45,46 At too small grain sizes, the hardness can decrease as has been observed for CrN 47 and ZrN. 48 This has been explained by grain boundary sliding and an increased porosity due to the large amount of grain boundaries.…”

Section: Mechanical Propertiesmentioning

confidence: 87%

Phase transformations in nanocomposite ZrAlN thin films during annealing

et al. 2012

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Nanocomposite Zr 0.52 Al 0.48 N 1.11 thin films consisting of crystalline grains surrounded by an amorphous matrix were deposited using cathodic arc evaporation. The structure evolution after annealing of the films was studied using high-energy x-ray scattering and transmission electron microscopy. The mechanical properties were characterized by nanoindentation on as-deposited and annealed films. After annealing in temperatures of 1050-1400°C, nucleation and grain growth of cubic ZrN takes place in the film. This increases the hardness, which reaches a maximum, while parts of the film remain amorphous. Grain growth of the hexagonal AlN phase occurs above 1300°C.

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Section: Mechanical Propertiesmentioning

confidence: 87%

Phase transformations in nanocomposite ZrAlN thin films during annealing

et al. 2012

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“…Consequently, relatively fewer studies were performed on ZrN x films. Various PVD techniques have been utilized to synthesize ZrN x films: ion plating [1], non-reactive magnetron sputtering [10], reactive RF or DC sputtering [11,12], cathodic arc sputtering [13], or dual ion beam sputtering [14], etc. The reactive sputtering method is commonly adopted to deposit ZrN x films due to its generality and tunable control of films' compositions and properties.…”

Section: Introductionmentioning

confidence: 99%

Microstructural and electrical characteristics of reactively sputtered ZrNx thin films

Ruan

Lii

et al. 2009

Journal of Alloys and Compounds

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“…It was reported that, mechanical, wear and corrosion properties of ZrN coatings were better than those of TiN coatings [16][17][18][19]. Thus, they have been increasingly used in industry for specific applications such as coating of tools for machining non-ferrous materials (aluminium or nickel alloys) and thermal barrier coatings in microelectronics, as well as decorative purposes [20][21][22].…”

Section: Introductionmentioning

confidence: 99%