Characterization of zirconia films deposited by r.f. magnetron sputtering

Corrosion Behavior of Reactive Sputtered Al2O3 and ZrO2 Thin Films on Mg Disk Immersed in Saline Solution

“…Zirconia (ZrO 2 ) coatings exhibit three crystal structures: low temperature (monoclinic) and two high temperature (tetragonal and cubic) structures [28][29][30][31] . The crystal structure transformation of Zr to ZrO 2 was evaluated by coating glass substrates with 200 nm thick ZrO 2 coatings with varying oxygen flow rate.…”

Synthesis of novel oxide layers on titanium by combination of sputter deposition and micro-arc oxidation techniques

“…Various methods for the deposition of ZrO2 thin layers have been applied, such as sputter deposition, electron beam deposition 2) , plasma 3) and ion beam 4) deposition, sol-gel processing 5) , and chemical vapor deposition. Among them, the sputter deposition technique has been widely used to achieve metallic oxides with homogeneity, good uniformity, and low deposition temperature 6,7) . The elementary event in sputter deposition is an atomic collision cascade.…”

Influence of sputtering power on oxygen reduction reaction activity of zirconium oxides prepared by radio frequency reactive sputtering

“…The physicochemical properties and microstructure of the sputtered films are strongly influenced by the deposition condition, such as RF power [17], substrate temperature [18], substrate-target distance [17], oxygen percentage [19,20] in the sputtering gases in the case of a RF reactive magnetron sputtering. Because the RF power during ZrO 2−x deposition was expected to affect the catalytic activity for ORR, in this study, ZrO 2−x thin films have been prepared by the RF reactive magnetron sputtering using different RF power.…”