Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry

Leng, J. M.; Chen, J.; Fanton, J. T.; Senko, Michael W.; Ritz, K. N.; Opsal, Jon

doi:10.1016/s0040-6090(97)00838-9

Cited by 31 publications

(15 citation statements)

References 10 publications

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“…The reflected beam goes through several beam splitters (BS4, BS2 and BS3), and then pass through a quarter wave plate, before being collected by a high resolution CCD camera. This optical characterization technique, that we call Reflectometry at Profile Level (RPL), was developed in collaboration with Nightingale EOS [9], and it is a variation of two former techniques, Beam Profile Reflectometry and Beam Profile Ellipsometry [10][11][12]. The more remarkable characteristics are that the system collects the reflectivity of a variety of angles of incidence and polarization states with a single measurement, and with a sub-micrometric spot size.…”

Section: Methodsmentioning

confidence: 99%

Sub-micrometric reflectometry for localized label-free biosensing

Casquel¹,

Soler²,

Holgado³

et al. 2015

Opt. Express

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In this work we present an optical technique for characterizing sub-micrometric areas based on reflectivity of the light as a function of angle of incidence for the two pure polarizations s and p, covering a range of angles of incidence from −71.80° to 71.80° with a resolution of 0.1°. Circular areas with a diameter in the order of 600 nm can be characterized, and the spectra for the two polarizations can be obtained with a single measurement. For biosensing purposes, we have fabricated several Bio Photonic Sensing Cells (BICELLs) consisting of interferometers of 1240 nm of SU-8 polymer over silicon. An indirect immunoassay is performed over these BICELLs and compared experimentally with FT-VIS-NIR spectrometry and theoretical calculations. The Limit of Detection (LoD) achieved is comparable with standard high resolution spectrometry, but with the capability of analyzing sub-micrometric domains for immunoassays reactions onto a sensing surface.

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Section: Methodsmentioning

confidence: 99%

Sub-micrometric reflectometry for localized label-free biosensing

Casquel¹,

Soler²,

Holgado³

et al. 2015

Opt. Express

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“…This I 1 and I 2 will be used as the ellipsometric parameters in the measurement, instead of the conventional tanΨ and ∆ pair. It is easy to show that this back focal plane spatial technique is equivalent to a quad detection used in some back focal plane ellipsometry techniques 28 . However, this spatial filtering allows us to do ellipsometric measurements in parallel to form a two-dimensional image without scanning.…”

Section: Imaging Ellipsometer Using a High Na Lensmentioning

confidence: 99%

“…This approach uses a high NA lens for illumination. The reflected light polarization altered by reflection from the sample surface is analyzed at the back focal plane of the high NA lens 27,28,29,30 . Back focal plane ellipsometry has high spatial resolution.…”

Section: Imaging Ellipsometer Using a High Na Lensmentioning

confidence: 99%

<title>Imaging ellipsometry for high-spatial-resolution metrology</title>

Zhan

Leger

2001

SPIE Proceedings

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The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

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“…Since exhibiting a series of chemical and physical properties, such as chemical stability, special optical properties useful for solar devices, interesting electronic properties and advantageous mechanical properties for technological applications, titanium oxide and oxinitride films obtained by various methods are intensively studied in the last years [1][2][3][4][5]. Among them, a particular class is formed by the multilayered coatings with special properties available for new optical applications, microelectronics and other fields [6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

An XPS Study on N Doped TiO<inf>2</inf> Sol-Gel Thin Films

Osiceanu

Anastasescu

et al. 2007

2007 International Semiconductor Conference

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In this paper we report on a systematic XPS study on N doped TiO2 sol-gel thin films deposited by sol-gel technique. For this purpose, four kinds of multilayered TiO2 films thermally treated in 02 and NH3 at 500 and 600°C were deposited on quartz substrate by sol-gel & dipping method A special attention has been focused on Nis and Ti2p photoelectron lines behaviour as a function of temperature and atmosphere of annealing process in order to investigate thefeatures ofthe Ti-0-N bonds.

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Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry

Cited by 31 publications

References 10 publications

Sub-micrometric reflectometry for localized label-free biosensing

Sub-micrometric reflectometry for localized label-free biosensing

<title>Imaging ellipsometry for high-spatial-resolution metrology</title>

An XPS Study on N Doped TiO<inf>2</inf> Sol-Gel Thin Films

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