2006
DOI: 10.4028/www.scientific.net/ssp.111.151
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Characterization of TiOxNy Films Grown by PECVD Method: Structural and Optical Properties

Abstract: Titanium oxynitride (TiOxNy) films were prepared by RF PECVD on Si(100) and glass substrates using nitrogen and argon mixture gas. Titanium iso-propoxide (Ti[OCH(CH3) 2] 4, 97%) was used as precursor with different nitrogen flow rate to control oxygen and nitrogen contents in the films. Changes of chemical states of constituent elements in the deposited films were examined by X-ray photoelectron spectroscopy (XPS) analysis. With increasing nitrogen flow rate the total amount of nitrogen was increased while tha… Show more

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Cited by 6 publications
(3 citation statements)
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“…The reactive sputtering process was found to be improved by pulsing the O 2 flow rate [23]. Titanium oxynitride films were prepared also by RF PECVD (plasma enhanced chemical vapor deposition) [24] and low pressure MOCVD [19,25,26]. An overview of the literature reveals few studies on TiO x N y coatings grown by CVD compared to PVD processes.…”
Section: Introductionmentioning
confidence: 99%
“…The reactive sputtering process was found to be improved by pulsing the O 2 flow rate [23]. Titanium oxynitride films were prepared also by RF PECVD (plasma enhanced chemical vapor deposition) [24] and low pressure MOCVD [19,25,26]. An overview of the literature reveals few studies on TiO x N y coatings grown by CVD compared to PVD processes.…”
Section: Introductionmentioning
confidence: 99%
“…Partially oxidized TiN, or oxynitride (TiNxOy) has garnered considerable interest due to its properties dependence on the N:O ratio [42][43][44][45]. Various forms of TiNxOy films were prepared using pulsed-laser deposition [46], magnetron sputtering [47,48] and plasma enhanced chemical vapour deposition [49]. Thus, direct oxidation of TiN can provide an easy and low-cost method to prepare nitrogen-doped TiO2.…”
Section: Project Motivationmentioning
confidence: 99%
“…Tentou-se a remoção utilizando-se uma segunda anodização a 120 V por 1 min;  Separação química: uso de uma solução de 0,1 M de HCl por 1 h para corroer e separar a base dos nanotubos de TiO2 do substrato de titânio, sendo que foi tentada uma solução de até 1 M de HCl por 24 h. Além das tentativas de descolamento da membrana, constatou-se também que durante os polimentos para reaproveitamento de lâminas de Ti após cumprirem seu papel na realização deste trabalho, foi possível observar que os nanotubos de TiO2 nitretados são muito mais resistentes ao ataque da solução de polimento (HNO3 + HF4 + CH3COOH, na razão 3:1:1 em volume). Isto de certa forma era esperado já que como Jung [56] constatou em seu trabalho, compostos na forma de oxinitretos metálicos (TiOxNy no caso) possuem um incremento na resistência à corrosão química e à abrasão em relação a compostos óxidos metálicos.…”
Section: ª Etapa -Nitretaçãounclassified