Characterization of TiO2 deposited on textured silicon wafers by atmospheric pressure chemical vapour deposition

Characterization of CVD TiN coating at different deposition temperatures and its application in hydrocarbon pyrolysis

“…This indicates that the TiN coating structures with apparent differences tend to lie on (220) preferred orientation as the deposition temperature increased. According to Vallejo et al, the preferred orientation of TiN coating is closely related to the preparation methods and the experimental conditions [30], and these results are in good agreement with those reports by Staia et al [31] and Cheng and Wen [32].…”

The Effect of Annealing on the Structural and Optical Properties of Titanium Dioxide Films Deposited by Electron Beam Assisted PVD

“…This reduction in thickness is due to film densification, crystallization, and grain growth. A similar behavior has been previously observed for TiO 2 films deposited by other techniques, which underwent thermal treatment at elevated temperatures [7,32,33]. Ellipsometry results show an increase in the refractive index for the annealed samples (Figure 8).…”

“…Several methods have been used to deposit TiO 2 thin films on various substrates, including electron-beam evaporation [3][4][5], chemical vapor deposition (CVD) [6][7][8], pulsed laser deposition (PLD) [9], sputtering [10,11], and sol-gel method [12][13][14]. The properties of deposited films, however, are highly dependent on the processing techniques and the deposition conditions [3,4,[15][16][17].…”

Effect of Argon-Oxygen Mixing Gas during Magnetron Sputtering on TiO2 Coatings

“…Titanium dioxide (TiO 2 ) exhibits wide band gap and possesses good passivating surface with low anodic dissolution rate making it one of the promising materials for corrosion protection [5][6][7]. Different deposition techniques, such as chemical vapor deposition [8], dip coating [9], magnetron sputtering [10], are used to deposit TiO 2 coatings.…”