Characterization of the accelerator SIMS setup at PSI/ETH Zurich

Ender, R.M.; Döbeli, M.; Suter, M.; Synal, Hans-Arno

doi:10.1063/1.52569

Cited by 8 publications

(6 citation statements)

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“…A more detailed description of the micro-capillary technique and its development is described by T.A. Suter (36). The tip diameters of the capillaries used for these experiments were between 50 µm and 200 µm.…”

Section: Methodsmentioning

confidence: 99%

Analytical Characterization of the Corrosion Mechanisms of WC-Co by Electrochemical Methods and Inductively-Coupled Plasma Mass Spectroscopy

Hochstrasser

Latkoczy²,

Virtanen

et al. 2006

ECS Trans.

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WC-Co exhibit a rather high susceptibility to corrosion in aqueous solutions, which is a result of complex reaction mechanisms. The local distribution of the surface reactions is thus of considerable interest. Electrochemical measurements provide only a one-sided information about the corrosion processes. For this purpose, comparative studies of elemental solution analysis by Inductively Coupled Plasma Mass Spectroscopy (ICP-MS) were carried out. The use of a flow cell allowed simultaneous online detection of dissolving elements. Surface characterization by XPS was used to determine the influence of solution contact on the surface composition. In order to elucidate the local aspects of the WC- Co corrosion behaviour, conventional electrochemical results (potentiodynamic polarization measurements) were compared to experiments, performed with a micro-capillary technique, which provides a focused view on the local corrosion situation. From these different methods, a more conclusive model presentation of the reaction mechanisms, taking place on WC-Co in aqueous solution, is proposed.

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Section: Methodsmentioning

confidence: 99%

Analytical Characterization of the Corrosion Mechanisms of WC-Co by Electrochemical Methods and Inductively-Coupled Plasma Mass Spectroscopy

Hochstrasser

Latkoczy²,

Virtanen

et al. 2006

ECS Trans.

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“…The microelectrochemical technique has been described elsewhere. 21 The technique basically consisted of placing a glass microelectrode with the ground tip (diam 2-1000 m) placed on the electrode with a layer of silicone rubber as a seal. The microcell was fixed, as shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

“…A modified high resolution potentiostat (current resolution 10 Ϫ12 to 10 Ϫ15 A, Jaissle 1002T-NC-3) was used having a current detection limit of 20 fA (dc) that enabled detection processes for probe tips in the micrometer range. 21 After a microelectrochemical measurement the investigated site was marked, rinsed with ethanol, and analyzed by SEM (Hitachi S-4700 and Zeiss DSM 960) and EDX spectroscopy (Hitachi S-4700 and Zeiss DSM 960).…”

Section: Methodsmentioning

confidence: 99%

Microelectrochemical Studies of Pit Initiation at Single Inclusions in Al 2024-T3

Suter¹,

Alkire²

2001

J. Electrochem. Soc.

184

102

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The onset of pitting at single inclusions on aluminum 2024-T3 has been observed in the micrometer range by using a microelectrochemical cell in order to study the mechanisms by which intermetallic particles, particularly AlCuMg and AlCuFeMn, induce localized corrosion. The results showed that pitting started at only few AlCuMg inclusions within 200 mV (saturated calomel electrode, SCE) of the pitting potential of large scale measurements. Pit initiation at lower potentials was found to occur at the adjacent matrix of AlCuMg inclusions. Measurements stopped which were made during pit initiation (maximum current ϭ 10 nA) did not indicate the presence of adsorbed copper around inclusions, but measurements which were made during pit propagation (maximum current ϭ 1 A) showed adsorbed copper. Compared to the AlCuMg inclusions the onset of pitting at AlCuFeMn inclusions occurred at potentials 200 to 600 mV more positive. Microcracks in the bulk material, presumably formed by hydrogen evolution, were found to provide starting points for pitting. The onset of pitting at areas without inclusions occurred at potentials higher than ϩ500 mV (SCE). If copper was homogeneously dissolved in the host matrix the resistance against pitting was strongly improved.

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“…The sample contribution was fitted with the Skewed Gaussian function [SkG(B, σ + , σ − )], which accounts for the asymmetric P (B) distribution within the FLL. 45,46 The second central moment of the sample contribution ∆B 2 s was obtained from the fitted σ + and σ − values. 45 The inverse squared magnetic penetration depth was further calculated as λ −2 [µm −2 ] = 9.32× ∆B 2 s − σ 2 nm [µs −1 ].…”

Section: Muon-spin Rotation/relaxation Experimentsmentioning

confidence: 99%

“…45,46 The second central moment of the sample contribution ∆B 2 s was obtained from the fitted σ + and σ − values. 45 The inverse squared magnetic penetration depth was further calculated as λ −2 [µm −2 ] = 9.32× ∆B 2 s − σ 2 nm [µs −1 ]. 18,46 Here σ nm is the nuclear moment contribution which is determined from the measurements above T c .…”

Section: Muon-spin Rotation/relaxation Experimentsmentioning

confidence: 99%

Emergence of flat bands and their impact on superconductivity in Mo5Si3-xPx

Khasanov,

Ruan,

Shi

et al. 2023

Preprint

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The superconductivity in systems containing the dispersionless (flat) bands might appear to be paradoxical, since the conventional Bardeen–Cooper–Schrieffer theory requires an infinite enhancement of the carrier masses. At the same time, the combination of a flat and steep (dispersive) bands within the multiple band scenario are expected to enhance the superconducting response and may potentially explain a high-temperature superconductivity in cuprates and metal hydrides. Here, we report on the magnetic penetration depths, the upper critical field, and the specific heat measurements together with the first-principles calculations for Mo$_5$Si$_{3-x}$P$_x$ superconducting family. The calculated band structure features a flat band, which gradually approaches the Fermi level as a function of phosphorus doping $x$. The flat band reaches the Fermi level at $x\simeq 1.3$, leading to an abrupt change of nearly all the superconducting quantities. In particular, a strong reduction of the coherence length $\xi$ and enhancement of the penetration depth $\lambda$ result in nearly factor of three increase of the Ginzburg-Landau parameter $\kappa=\lambda/\xi$ (from $\kappa\simeq 25$ for $x< 1.3$ to $\kappa\simeq 70$ for $x> 1.3$) thus initiating the transition of Mo$_5$Si$_{3-x}$P$_x$ from a moderate to an extreme type-II superconductivity. The superfluid density data placed on the 'Uemura plot' result in two separated branches thus indicating that emergency of a flat band leads to enhancement of correlations between conducting electrons.

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Characterization of the accelerator SIMS setup at PSI/ETH Zurich

Cited by 8 publications

References 0 publications

Analytical Characterization of the Corrosion Mechanisms of WC-Co by Electrochemical Methods and Inductively-Coupled Plasma Mass Spectroscopy

Analytical Characterization of the Corrosion Mechanisms of WC-Co by Electrochemical Methods and Inductively-Coupled Plasma Mass Spectroscopy

Microelectrochemical Studies of Pit Initiation at Single Inclusions in Al 2024-T3

Emergence of flat bands and their impact on superconductivity in Mo5Si3-xPx

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