Characterization of sputtered amorphous platinum dioxide films

Abstract

Amorphous platinum dioxide, a-PtO2, films are formed commonly during reactive sputtering of platinum at relatively high power density levels and high oxygen partial pressures. The structure of a-PtO2 is intermediate between the crystalline alpha and beta phases of this compound and either phase may form upon annealing or by lowering the power density during sputtering. Amorphous platinum dioxide is a semiconductor, and its resistivity depends on deposition parameters. Films of a-PtO2 are dense, chemically resistant, smooth, reflective, and have a hardness similar to titanium nitride. The films may be reduced in hydrogen at room temperature or in carbon monoxide at 200 °C to produce metallic platinum with crystallite sizes in the range of 5–10 nm. Any of these properties may be exploited to produce films that could be used in the development of sensors, optical materials, and in microelectronics.

Remote Plasma ALD of Platinum and Platinum Oxide Films

“…18 The optical Tauc bandgap was ϳ1.5 eV, which is close to the bandgap reported for sputtered amorphous PtO 2 ͑1.2-1.3 eV͒. 8 Material properties.-As shown in Table I both the remote plasma and thermal ALD process result in very similar material properties for the Pt films. In both cases high density ͑ϳ21 g/cm 3 ͒, low resistivity ͑ϳ15 ⍀ cm͒, and high purity Pt films were deposited.…”

“…PtO 2 film is amorphous or nanocrystalline, 13 and no diffraction peaks from the ␣ and ␤ PtO 2 phases can be identified in the XRD spectra. 8 Temperature dependence.- Figure 4 shows the growth per cycle for the three processes over a wide temperature range. The thermal ALD Pt process has a temperature window starting at ϳ200°C.…”

“…[1][2][3][4][5][6][7] While being less investigated, platinum oxide is of interest because of its optical properties and because PtO x can be ͑locally͒ reduced to Pt. [8][9][10] In the research efforts toward the applications of these films deposited by ALD, nucleation properties, material quality, and process temperature window are of key importance.…”

Photoelectron Spectroscopy of Nickel, Palladium, and Platinum Oxide Anions

“…As discussed below, peak G is the only manifestation of vibrational activity in the NiO − photoelectron spectrum. This 1.66-Å anion bond length is consistent with the absence of a detectable vibrational progression for the 3 2,1 states, with a bond length of 1.627Å (11). The remaining peaks are all v = 0 transitions with r e < 0.02Å (see Table 2).…”

Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective

“…There is confirmation that oxygen-rich atmospheres will produce oxides even in CVD [102] and that the resistivity of the films are a strong function of the degree of oxidized material [103].…”