Characterization of Silicon Native Oxide Formed in SC-1, H₂O₂ and Wet Ozone Processes

Abstract

The structures of silicon native oxides formed in the SC-1, H2O2 and wet ozone processes were characterized using X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM) and Fourier transform infrared spectroscopy (FT-IR). Spectral simulation was performed to clarify the FT-IR spectra, assuming that the native oxide was pure silicon dioxide. Effective medium theories were applied to understand deviations of the observed spectra from the calculated ones. The deviations between the native oxide thickness evaluated by XPS and the absolute thickness obtained by TEM were also discussed. These deviations can be explained if the void is incorporated in the native oxides and the interface between the native oxide and the basal silicon obtained by the wet ozone process has a relatively smooth surface and a structure more similar to that of pure silicon dioxide, compared with that obtained by SC-1 or H2O2 treatment.

Spectroscopic characterization of naturally and chemically oxidized silicon surfaces

“…This value is in good agreement with those reported in the literature ͑6 -10 Å͒. [10][11][12] We also found no clear difference in the chemical oxidation properties among the Si͑100͒, ͑110͒, and ͑111͒ surfaces.…”

“…3 The uniformity of an oxide film formed on silicon surface by RCA processing has been investigated using STM by Aoyama et al 4 The structure of surface oxides formed in various chemical solutions, including RCA, has also been studied using glancing incidence x-ray reflectometry and FTIR by Sugita et al 5 and using XPS, transmission electron microscopy, and FTIR by Ohwaki et al 6 The purpose of this article is to study the effects of HF and SC1 treatments on the surface properties of silicon wafers using spectroscopic ellipsometry ͑SE͒ and photoreflectance ͑PR͒ spectroscopy. SE is a very surface-sensitive technique, which enables detection of submonolayer coverage of the surface by adsorbed species.…”

Thin organic heterostructures deposited via organic vapor phase deposition: spectroscopic ellipsometry characterization

“…3(c) and (d). The optical response of heterogeneous materials which are mixtures of constituents with different optical constants can be modeled using the effective medium approximation (EMA) [15]. For the most general case of isotropic systems consisting of two media a and b having the dielectric constants a and b embedded in a host medium with dielectric constant h ; the dielectric constant can be written in the approximation of spherical inclusions as…”

Comparative study of dielectric functions of complex organic heterostructures

“…The thicknesses of the mixed Alq 3 /α-NPD layers were evaluated using two different multi-sample procedures. In the first one a linear EMA [21] combination of the previous determined dielectric functions is used to give the dielectric function of the mixed layer:…”