2013
DOI: 10.1088/0957-0233/25/1/015401
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Characterization of SEM speckle pattern marking and imaging distortion by digital image correlation

Abstract: Surface patterning by e-beam lithography and SEM imaging distortions are studied via digital image correlation. The global distortions from the reference pattern, which has been numerically generated, are first quantified from a digital image correlation procedure between the (virtual) reference pattern and the actual SEM image both in secondary and backscattered electron imaging modes. These distortions result from both patterning and imaging techniques. These two contributions can be separated (without resor… Show more

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Cited by 40 publications
(35 citation statements)
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“…The latter case is the most favorable for kinematic measurements since brightness changes due to out-of plane 5 displacements are essentially prevented. New generations of Scanning Electron Microscopes (SEM) with field emission guns exhibit far less imaging distortions than their predecessors based on Tungsten probe technology [1], and are therefore very well adapted to performing digital image correlation (DIC) measurements [2, 3,4].…”
Section: Introductionmentioning
confidence: 99%
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“…The latter case is the most favorable for kinematic measurements since brightness changes due to out-of plane 5 displacements are essentially prevented. New generations of Scanning Electron Microscopes (SEM) with field emission guns exhibit far less imaging distortions than their predecessors based on Tungsten probe technology [1], and are therefore very well adapted to performing digital image correlation (DIC) measurements [2, 3,4].…”
Section: Introductionmentioning
confidence: 99%
“…Besides, the mechanism of trace generation in EBSD images has not 25 been investigated. An alternative solution is to deposit in situ computer-generated patterns onto the specimen surface by microlithography with a precise knowledge of the reference pattern [3]. Another advantage of the in situ deposition is that the size, shape and thickness of the speckles are easily and precisely controlled by the SEM.…”
Section: Introductionmentioning
confidence: 99%
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“…DIC requires a gray level texture with a dynamic range as large as possible with local contrast variations. In the present case, because the natural texture of the material does not provide enough contrast, a computergenerated random pattern is deposited onto the surface by microlithography [7]. The displacement fields are measured between two consecutive images with a continuous finite element based DIC procedure [8,9].…”
Section: Kinematic Measurements Using Digital Image Correlationmentioning
confidence: 99%
“…Displacement fields, denoted u k , are then measured using DIC between the acquired images and the reference image of the pattern. Because large rotations are prescribed, the previous DIC formulation has been adapted considering finite transformation kinematics [7]. The partition method consists of considering each displacement field u k as a composition of three transformations, namely, a patterning distortions field υ g , identical for each u k , a rotation of an angle θ k , and an imaging distortions field υ d , assumed to be time-independent.…”
Section: Partition Of Distortionsmentioning
confidence: 99%