2018
DOI: 10.1016/j.ultramic.2017.08.005
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On the use of SEM correlative tools for in situ mechanical tests

Abstract: In situ SEM mechanical tests are key to study crystal plasticity. In particular, imaging and diffraction (EBSD) allow microstructure and surface kinematics to be monitored all along the test. However, to get a full benefit from different modalities, it is necessary to register all images and crystallographic orientation maps from EBSD into the same frame. Different correlative approaches tracking either Pt surface markings, crystal orientations or grain boundaries, allow such registrations to be performed and … Show more

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Cited by 16 publications
(12 citation statements)
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References 41 publications
(62 reference statements)
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“…The reconstructed sample surface is identical to the inverse pole figure of the sample before Pt layer deposition, which can be found in Ref. [31]. It should be noted that due to the discrete nature of the FIB milling process, the topography reconstructed by this procedure has terraces, each of height 100 nm (or 1 pixel).…”
Section: Indexing Of Crystal Orientation At Grain Boundaries Is Diffisupporting
confidence: 60%
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“…The reconstructed sample surface is identical to the inverse pole figure of the sample before Pt layer deposition, which can be found in Ref. [31]. It should be noted that due to the discrete nature of the FIB milling process, the topography reconstructed by this procedure has terraces, each of height 100 nm (or 1 pixel).…”
Section: Indexing Of Crystal Orientation At Grain Boundaries Is Diffisupporting
confidence: 60%
“…This is interpreted as a slow-scan direction error (due to the repositioning inaccuracy at the beginning of each new scanned line). An adapted global DIC procedure has been developed to correct this specific error by acquiring two images with different scanning directions [30,31], yet the algorithm cannot be applied to two images on the inclined sample by the current SEM. Without correcting the slow-scan direction error, the root mean square (RMS) average of u x shown in Figure 2 It should be noted that an uncertainty level of 8.1 nm is very satisfactory, with respect to the pixel size of 53.7 nm.…”
Section: Uncertainty Quantificationmentioning
confidence: 99%
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