Characterization of refractory organic substances by NEXAFS using a compact X-ray source

Abstract

Purpose We present the characterization of environmental samples using near-edge X-ray absorption fine structure (NEXAFS) spectra recorded with an in-house device. We want to point out the feasibility of such an easily accessed complementary technique, if not sometimes alternative to NEXAFS studies performed with synchrotron radiation, as the number of compact setups is increasing. Materials and methods The experiments were carried out using a laser-driven plasma source. We studied heterogeneous samples like refractory organic substances to demonstrate the potential of NEXAFS spectra, achieved by such an instrument, concerning specimens of high chemical complexity.Results and discussion From the respective resonance peaks in the spectra, the presence of certain functional groups, such as aromatic or carbonyl groups, is verified, and the elemental composition is estimated. The results of the reference samples are consistent with the literature. For the environmental samples, external influences of the extraction solvent or fertilizers can be determined from the spectra. Conclusions This could provide the possibility to perform test experiments with samples, which are later studied in more detail with synchrotron light and might as well give an impulse on the broader spread of the application of NEXAFS spectroscopy.

High-flux table-top soft x-ray source driven by sub-2-cycle, CEP stable, 185-μm 1-kHz pulses for carbon K-edge spectroscopy

“…The data were extracted from a single 5-min measurement. We can clearly identify the individual fine structure peaks with the known orbitals in polyimide (shown in Table 1) and the data are in agreement with state of the art synchrotron [15] and incoherent x-ray [14] data.…”

“…A peak fit with known transitions (blue) from Ref [15]. agrees very well (black curve) with the measurement.…”

Single-Shot near Edge X-ray Fine Structure (NEXAFS) Spectroscopy Using a Laboratory Laser-Plasma Light Source

“…For more information how the assignment was performed, based on the probability of occurring bonds please see [9,22]. By a comparison to the theoretical value, calculated as a percent by weight, w/w %, of the composition, the error of composition analysis was evaluated using a root-mean-square deviation approach defined by Equation (3):$\delta =\frac{1}{N}\sqrt{true{\sum }_{i=1}^N{\left(C_{Ti}-C_{Mi}\right)}^2}$ where N is the number of elements, considered in the composition analysis ( N = 3 ) and i defines the index for each element {C, H, O} = {1, 2, 3}.…”

EUV SOURCE AT HiLASE: THE STATE OF THE ART

“…Due to the different properties of the generated plasmas we will be able to produce EUV beams in two different wavelength ranges: 13.5 nm and in the water window range, 2.33-4.40 nm. The first wavelength is particularly suitable for EUV lithography [Bakshi 2006] and for high precision and high volume manufacturing, while the water window range is well known for its various application in biology [Wachulak 2015, Sedlmair 2012 (spanning from imaging to functionalization of materials).…”