2008
DOI: 10.1016/j.surfcoat.2007.10.014
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Characterization of magnetron sputtered rhodium films for reflective coatings

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Cited by 54 publications
(58 citation statements)
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“…For deposition at elevated temperatures it is observed that the grain size (individual grains forming columnar crystallites), calculated from Scherrer's formula [15], is larger in comparison to RT depositions. For rhodium films an identical phenomenon has been observed [6]. No effect of deposited thickness (ranging from 40 to 670 nm), deposition rate (ranging from 0.1 to 0.7Å/s) and substrate material is observed on the grain structure, surface morphology or reflectivity.…”
Section: Evaporated Molybdenum Filmssupporting
confidence: 69%
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“…For deposition at elevated temperatures it is observed that the grain size (individual grains forming columnar crystallites), calculated from Scherrer's formula [15], is larger in comparison to RT depositions. For rhodium films an identical phenomenon has been observed [6]. No effect of deposited thickness (ranging from 40 to 670 nm), deposition rate (ranging from 0.1 to 0.7Å/s) and substrate material is observed on the grain structure, surface morphology or reflectivity.…”
Section: Evaporated Molybdenum Filmssupporting
confidence: 69%
“…3, curve) [5]. Depositions of molybdenum by magnetron sputtering yield a grain size (Table 1) comparable to Rh films deposited by the same technique [6]. Similar structural and optical results are obtained for depositions at a lower working pressure (0.75 Pa).…”
Section: Magnetron Sputtered Molybdenum Filmsmentioning
confidence: 58%
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“…The test in 2008-2009 was performed with 32 mirrors made of polycrystalline molybdenum (Mo-poly) including four specimens coated with a 1 µm thick layer of rhodium (Rh). The coating was obtained by magnetron sputtering, as described in [7,8].…”
Section: Experimental Details: Exposure and Analysesmentioning
confidence: 99%
“…Rhodium thin films prepared by electron-beam evaporation (Masek et al 1995), chemical vapor deposition (Bhaskar et al 2008;James et al 2005), electrochemical deposition (Lin et al 2002), DC and RF magnetron sputtering technique (Marot et al 2008b) are well documented in literature. There are few reports on the Rh thin films fabricated via pulsed laser deposition (PLD) technique (Drogoff et al 1999;Saidani et al 2011).…”
Section: Introductionmentioning
confidence: 99%