Characterization of magnetron-sputtered chromium and iron nitride films

Kacsich, T.; Niederdrenk, Matthias; Schaaf, Peter; Lieb, Klaus; Geyer, U.; Schulte, O.

doi:10.1016/s0257-8972(97)00035-2

Cited by 16 publications

(3 citation statements)

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“…We have recently reported on characteristics like phase formation and surface morphology of magnetron-sputtered chromium nitride films of CrN and Cr 2 N stoichiometries as functions of the deposition temperature [6,7]. In the present study we have extended our investigations of chromium nitride films to their corrosion behaviour after deposition at different substrate temperatures.…”

Section: Introductionmentioning

confidence: 79%

“…Chromium nitride samples of CrN and Cr 2 N stoichiometries were deposited via reactive RFmagnetron sputtering of pure chromium (99.95% purity) in an argon-nitrogen atmosphere onto Si backings of (111) orientation. The deposition temperature was either 20 or 550 • C; the film thickness d 0 was in the range 150-500 nm (see table 1) [6,7]. The oxidation of these films at temperatures T ox = 500-880 • C and in 1 bar air was performed in a commercial furnace.…”

Section: Preparation Of Thin Films Of Crn and Cr 2 N Stoichiometries ...mentioning

confidence: 99%

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Oxidation of thin chromium nitride films: kinetics and morphology

Kacsich

Lieb

Schaper

et al. 1996

J. Phys.: Condens. Matter

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Magnetron-sputtered, 150 - 500 nm thick chromium nitride films of CrN and stoichiometry were exposed to air at 500 - . Oxide scale growth and morphology and the phase transformations during oxidation were investigated by means of Rutherford backscattering spectrometry, resonant nuclear reaction analysis, scanning force microscopy (SFM) and x-ray diffraction. A combined logarithmic and parabolic scale growth was found and interpreted as due to inwards diffusion of oxygen via grain boundaries (logarithmic) and outwards lattice diffusion of Cr (parabolic). Pt-marker experiments confirmed this interpretation. The activation energies of the two processes were determined to be Q = 60(20) and . During oxidation of a transformation into CrN was observed. A linear increase in the surface roughness and surface grain size with the oxide layer thickness was found by SFM.

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Section: Introductionmentioning

confidence: 79%

Section: Preparation Of Thin Films Of Crn and Cr 2 N Stoichiometries ...mentioning

confidence: 99%

Oxidation of thin chromium nitride films: kinetics and morphology

Kacsich

Lieb

Schaper

et al. 1996

J. Phys.: Condens. Matter

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“…Its efficiency was calibrated with a CrN reference sample prepared by reactive magnetron sputtering. 12 Its nitrogen concentration was determined by Rutherford backscattering spectrometry ͑RBS͒ with an accuracy better than 2 at. %.…”

Section: Introductionmentioning

confidence: 99%

Influence of the spatial laser intensity distribution on laser nitriding of iron

Landry

Lieb

Schaaf

1999

Journal of Applied Physics

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Laser nitriding of iron and other metals is governed by the complicated interplay of the laserplasma-solid interactions which lead to a superposition of several mechanisms. This work reports on the drastic influence of the spatial laser intensity distribution on the nitriding process. The effects of the lateral laser intensity on the nitrogen lateral and depth profiles, the phase formation, the surface topology, and the microhardness are revealed by resonant nuclear reaction analysis, Mössbauer spectroscopy, surface profilometry, and nanoindentation. Homogeneous laser beams lead to a strong reduction or almost the absence of the piston mechanism, thus confining the nitriding and the transport processes to the laser spot and avoiding the fallout. The details are discussed in relation to the results obtained for the raw-beam irradiations. Much higher nitrogen saturation concentrations can be achieved with a homogenized beam, but the surface hardness and the hardening depth are lower than in the case of irradiation with the raw beam. The ⑀ nitride is only found for raw-beam irradiation.

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