Effect of substrate temperature and bias voltage on DC magnetron sputtered Fe–N thin films

Wang, X.; Zheng, Weitao; Tian, Hongwei; Yu, Shansheng; Wang, L.L.

doi:10.1016/j.jmmm.2004.06.002

Cited by 29 publications

(11 citation statements)

References 37 publications

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“…21,26 Ferromagnetic nitrides of iron have received tremendous interests in magnetic functional devices. 31,32 On the other hand, NiFe alloy with a composition of Ni 80 Fe 20 is a well-known soft-magnetic alloy and is known as permalloy. It forms a face centered cubic structure of the type Ni 3 Fe.…”

Section: 16mentioning

confidence: 99%

Nanocrystallization and amorphization induced by reactive nitrogen sputtering in iron and permalloy

Gupta

2005

Phys. Rev. B

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Thin films of iron and permalloy (Ni80Fe20) were prepared using an Ar+N2 mixture with magnetron sputtering technique at ambient temperature. The nitrogen partial pressure, during sputtering process was varied in the range of 0 ≤ RN2 ≤ 100%, keeping the total gas flow at constant. At lower nitrogen pressures (RN2 ≤ 33%) both Fe and NiFe, first form a nanocrystalline structure and an increase in RN2, results in formation of an amorphous structure. At intermediate nitrogen partial pressures, nitrides of Fe and NiFe were obtained while at even higher nitrogen partial pressures, nitrides themselves became nanocrystalline or amorphous. The surface, structural and magnetic properties of the deposited films were studied using x-ray reflection and diffraction, transmission electron microscopy, polarized neutron reflectivity and using a DC extraction magnetometer. The growth behavior for amorphous film was found different as compared with poly or nanocrystalline films. The soft-magnetic properties of FeN were improved on nanocrystallization while those of NiFeN were degraded. A mechanism inducing nanocrystallization and amorphization in Fe and NiFe due to reactive nitrogen sputtering is discussed in the present article.

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Section: 16mentioning

confidence: 99%

Nanocrystallization and amorphization induced by reactive nitrogen sputtering in iron and permalloy

Gupta

2005

Phys. Rev. B

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“…Since the first report on the possible 'giant-moment' ␣ -Fe 16 N 2 phase by Kim and Takahashi, ferromagnetic iron nitride compounds, such as ␣-Fe (N), -Fe 3 N (hcp), ␥ -Fe 4 N (fcc), and ␣ -Fe 16 N 2 (bct), have been intensively investigated [9][10][11][12][13][14][15][16][17]. Recently, synthesis and characterization of nanocrystalline iron nitride have been attracting widespread attention because of their unique magnetic properties and the improved performances determined by their particle sizes, surface structures and inter-particle interaction [18][19][20][21][22][23][24][25].…”

Section: Introductionmentioning

confidence: 99%

Structural and magnetic properties of nanocrystalline Fe–N thin films and their thermal stability

Wang

Zheng

et al. 2007

Journal of Alloys and Compounds

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“…In the Fe-N binary phase diagram the major phases are Fe 16 N 2 , Fe 4 N, Fe 3 N, Fe 2 N, FeN, and Fe 3 N 4 with an increasing atomic percentage of N [ 5 ]. Compound forming at.…”

Section: Introductionmentioning

confidence: 99%

“…The nucleation of γ′-Fe 4 N can be facilitated by the addition of hydrogen gas in the flow gas mixture during sputtering [ 24 ]. The coercivity of the films increases directly with substrate temperature and decreases with the increase of substrate bias voltage [ 5 ]. Coercivity of the films increases and the magnetic moment of the Fe atoms decreases almost linearly with the nitrogen content [ 25 ].…”

Section: Introductionmentioning

confidence: 99%

The Effect of Sputtering Parameters and Doping of Copper on Surface Free Energy and Magnetic Properties of Iron and Iron Nitride Nano Thin Films on Polymer Substrate

et al. 2017

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The objective of this study was to deposit thin films on PET polymer substrate and examine the functional properties systematically. Their properties have been studied as a function of the N2-Ar flow rates, deposition time span and Cu doping. Iron nitride film deposited on both sides exhibits ferromagnetic phases, γ′-Fe4N and ε-Fe3N co-existed, shows negligible magnetic anisotropy. Other samples show the evolution of N-rich (FeN, Fe2N) and N-poor (Fe16N2, Fe3N, Fe4N) phases under different deposition time conditions. XPS analysis and free energy calculations confirmed that co-sputtered Fe-Cu thin films are more stable than layer deposited counterparts. From VSM results it is evident that the dominant phase, changes steadily from the ferromagnetic α-Fe (N) to the paramagnetic ξ-Fe2N with the increase of nitrogen flow rates and the ordering of the nitrogen atoms. Binding energy increases steadily from 733 eV to 740 eV with the increasing thickness of thin films from 74 nm to 94 nm. It was observed that surface energy decreases as the contact angle of glycol increases and changes the thin film surface from polar to nonpolar. TEM images indicate that cubic γ′-Fe4N and ε-Fe3N nano particles oriented in preferred directions dispersed uniformly in the amorphous iron nitride matrix.

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Effect of substrate temperature and bias voltage on DC magnetron sputtered Fe–N thin films

Cited by 29 publications

References 37 publications

Nanocrystallization and amorphization induced by reactive nitrogen sputtering in iron and permalloy

Nanocrystallization and amorphization induced by reactive nitrogen sputtering in iron and permalloy

Structural and magnetic properties of nanocrystalline Fe–N thin films and their thermal stability

The Effect of Sputtering Parameters and Doping of Copper on Surface Free Energy and Magnetic Properties of Iron and Iron Nitride Nano Thin Films on Polymer Substrate

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