2012
DOI: 10.1063/1.4719052
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Characterization of low temperature InGaAs-InAlAs semiconductor photo mixers at 1.55 μm wavelength illumination for terahertz generation and detection

Abstract: The structural, optical, and electrical properties of undoped and Be doped lattice matched InGaAs-InAlAs multiple quantum well structures, grown by molecular beam epitaxy (MBE) at low ($250 C) and normal ($450 C) growth temperatures, have been investigated in detail. Double crystal x-ray diffraction studies showed that the thickness of the low temperature (LT) grown quantum well (QW) layers decrease with post growth annealing, while the normal temperature grown QW layers retain their initial thickness. This be… Show more

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Cited by 15 publications
(5 citation statements)
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“…Such behaviour was similar in both samples. However, sample V2094 exhibited almost one order of magnitude higher resistance values, which is attributed to the higher doping concentration leading to more compensated material [16].…”
Section: Results – Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Such behaviour was similar in both samples. However, sample V2094 exhibited almost one order of magnitude higher resistance values, which is attributed to the higher doping concentration leading to more compensated material [16].…”
Section: Results – Discussionmentioning
confidence: 99%
“…The uniform doping profile proved to increase the resistivity of the material and thus devices fabricated on it are expected to be suitable for detectors while the selectively doping profile increased the mobility of the material and thus devices fabricated on them are expected to be suitable for emitters. The layer sequence of the MQW structures as well as a detailed characterisation of these material systems is described elsewhere [16]. The devices operating at 1 μm excitation wavelength were based on LT‐In 0.3 Ga 0.7 As photoconductors while the devices operating at 800 nm excitation wavelength were based on LT‐GaAs photoconductors.…”
Section: Devices – Measurementsmentioning
confidence: 99%
“…On the one hand it was reported that annealing increased the electron lifetime due to the formation of arsenic clusters, similarly to LTG-GaAs. 27,28,35 On the other hand a recent study on annaled Be-doped LTG-InGaAs/InAlAs multilayer structures revealed a decrease of the electron lifetime for annealing temperatures between 350 • C and 600 • C. 34 In this publication we address this inconsistency and show that annealing indeed increases the electron lifetime due to the precipitation of arsenic antisites.…”
Section: Low Temperature Growthmentioning
confidence: 79%
“…The mentioned characteristics of GaN together with its capabilities of providing high 2-D electron densities and high longitudinal-optical (LO) phonon of ∼90 meV make it one of the most promising semiconductors for the future of generation, detection, mixing, and frequency multiplication of electromagnetic waves in the THz frequency regime. 185 Researchers have proposed and fabricated several innovative GaN-based THz devices, such as GaN-based plasma THz HFETs, 184,[186][187][188] negative differential resistance diode oscillators, [189][190][191] heterodimensional Schottky diodes, 192,193 impact avalanche transit-time diodes, 194,195 planar Gunn diode, 196 antenna-coupled field-effect transistors, [196][197][198][199][200][201] THz power radiators based on the Volterra-Wiener theory of nonlinear systems with frequencies, 202 high electron mobility transistors, [203][204][205] and QCLs. [206][207][208][209][210][211][212][213][214][215][216][217][218][219] GaN-based devices can fundamentally improve the resolution by enabling THz imaging systems with frequencies higher than 5 THz through enhancing the photon intensity.…”
Section: Advances In Terms Of Materialsmentioning
confidence: 99%