1990
DOI: 10.1143/jjap.29.1435
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Characterization of GaAs and AlGaAs Layers Grown by Laser Atomic Layer Epitaxy

Abstract: Raman spectra were measured at 300 K to characterize GaAs and AlGaAs layers grown by laser atomic layer epitaxy. The quality of the GaAs patterned layer grown by laser scanning was uniform in spite of the laser intensity profile. The molar fraction of Al in the peripheral region of the AlGaAs layer is affected by the intensity profile of the laser beam.

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“…The results of the longitudinal and transversal mode measurements are shown in Fig. 1, which confirms the GaAs wafer's single crystal zinc blende structure by the observation of pure transverse optical (TO) and longitudinal optical (LO) peaks located at 268 cm −1 and 292 cm −1 [7]. The PL was excited at 266 nm with a vertically polarized pulsed (11 ns, 22 kHz) solid-state laser from Laserglow Inc., whereas the emission was recorded with Ocean Optics (USB 2000) and StellarNet (C-SR-200) fiber spectrometers.…”
supporting
confidence: 74%
“…The results of the longitudinal and transversal mode measurements are shown in Fig. 1, which confirms the GaAs wafer's single crystal zinc blende structure by the observation of pure transverse optical (TO) and longitudinal optical (LO) peaks located at 268 cm −1 and 292 cm −1 [7]. The PL was excited at 266 nm with a vertically polarized pulsed (11 ns, 22 kHz) solid-state laser from Laserglow Inc., whereas the emission was recorded with Ocean Optics (USB 2000) and StellarNet (C-SR-200) fiber spectrometers.…”
supporting
confidence: 74%