Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams

Shimada, Yusuke; Nishimura, Hiroaki; Nakai, M.; Hashimoto, Kazuhisa; Yamaura, Michiteru; Tao, Y.; Shigemori, K.; Okuno, T.; Nishihara, Katsunobu; Kawamura, T.; Sunahara, A.; Nishikawa, Takashi; Sasaki, Akira; Nagai, Keiji; Norimatsu, T.; Fujioka, Shinsuke; Uchida, Satoshi; Miyanaga, Noriaki; Izawa, Yasukazu; Yamanaka, C.

doi:10.1063/1.1856697

Cited by 113 publications

(59 citation statements)

References 14 publications

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“…A Nd:glass laser system, GEKKO-XII at the Institute of Laser Engineering (ILE) in Osaka University was used to produce the 1D expanding uniform plasma [19]. The GEKKO-XII laser facility consists of 12 laser beams each at a wavelength of 1.053 μm and a constant 1 J pulse energy, irradiating a total energy of 12 J, with a temporal Gaussian-shaped pulse width of 1.3 ns [full width at half maximum (FWHM)].…”

Section: Characteristics Of the Gd Plasmas For Beuv Source Applicationsmentioning

confidence: 99%

Laser-Produced Heavy Ion Plasmas as Efficient Soft X-Ray Sources

Higashiguchi¹,

Dunne²,

O’Sullivan³

2016

Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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We demonstrate extreme ultraviolet (EUV) and soft x-ray sources in the 2-to 7 -nm spectral region related to the beyond extreme ultraviolet (BEUV) question at 6.x nm and a water window source based on laser-produced high-Z plasmas. Strong emissions from multiply charged ions merge to produce intense unresolved transition array (UTA) toward extending below the carbon K-edge (4.37 nm). An outline of a microscope design for single-shot live-cell imaging is proposed based on a high-Z UTA plasma source, coupled to x-ray optics. We will discuss the progress and Z-scaling of UTA emission spectra to achieve lab-scale table-top, efficient, high-brightness high-Z plasma EUV-soft x-ray sources for in vivo bio-imaging applications.

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Section: Characteristics Of the Gd Plasmas For Beuv Source Applicationsmentioning

confidence: 99%

Laser-Produced Heavy Ion Plasmas as Efficient Soft X-Ray Sources

Higashiguchi¹,

Dunne²,

O’Sullivan³

2016

Plasma Science and Technology - Progress in Physical States and Chemical Reactions

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“…For example, 3% CE has been demonstrated using a solid density Sn target. 3 However, mitigation of heavy debris from the plasma remains a critical issue. 2 H, C, N, and O are also very critical to the collector optics due to the high duty cycle.…”

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confidence: 99%

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

Tao

Tillack

2006

Applied Physics Letters

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The authors present evidence of the reduction of fast ion energy from laser-produced Sn plasma by introducing a low energy prepulse. The energy of Sn ions was reduced from more than 5keV to less than 150eV nearly without loss of the in-band conversion from laser to 13.5nm extreme ultraviolet (EUV) emission as compared with that of a single pulse. The reason may come from the interaction of the main pulse with preplasma instead of the full density solid surface. This makes it possible to use the full density Sn target in the practical EUV lithography source.

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“…The shorter wavelengths appeared due to the increased electron temperature caused by the longer pulse durations. 27 This was not observed at Tokyo Tech due to the shorter pulse duration used.…”

Section: A Euv Spectra and Imaging Plate Datamentioning

confidence: 94%

“…The emission has been characterized as an unresolved transmission array (UTA) from Sn 8+ to Sn 21+ as 4d-4f transmission 26 typically obtained from laser intensities of 10 10 W/cm 2 from Nd:YAG lasers. 27 The FIG. 2.…”

Section: A Euv Spectra and Imaging Plate Datamentioning

confidence: 99%

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

Musgrave

Takehiro

Ugomori

et al. 2017

Review of Scientific Instruments

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With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

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Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams

Cited by 113 publications

References 14 publications

Laser-Produced Heavy Ion Plasmas as Efficient Soft X-Ray Sources

Laser-Produced Heavy Ion Plasmas as Efficient Soft X-Ray Sources

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

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