“…Over the last decade, the semiconductor β-Ga 2 O 3 has generated significant interest in the international community due to its ultrawide band gap (4.7–4.9 eV), range of shallow n-type dopants (Si, Sn, Ge), − and its ability to be grown from the melt, allowing the production of large-area, cost-effective substrates. , Due to these considerations, β-Ga 2 O 3 is pursued for applications in the power electronics − and UV photodetector − industries. Bulk growth of β-Ga 2 O 3 has largely been implemented with the edge-defined film-fed growth (EFG) − and the Czochralski method. ,, A wide variety of epitaxial growth methods have been implemented to grow high-quality β-Ga 2 O 3 films, including metal-organic chemical vapor deposition (MOCVD), − halide vapor phase epitaxy (HVPE), , molecular beam epitaxy − (MBE), and pulsed laser deposition (PLD). − …”