2020
DOI: 10.1007/s11664-020-07985-3
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of Epitaxial β-(Al,Ga,In)2O3-Based Films and Applications as UV Photodetectors

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
10
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 15 publications
(10 citation statements)
references
References 15 publications
0
10
0
Order By: Relevance
“…The inset of Fig. 2(c) displays the relationship between (αhν) and E g , which is calculated according to the Tauc formula combined bandgap of the film [32] hν…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…The inset of Fig. 2(c) displays the relationship between (αhν) and E g , which is calculated according to the Tauc formula combined bandgap of the film [32] hν…”
Section: Resultsmentioning
confidence: 99%
“…Under an external bias voltage of 50 V, the calculation shows that, EQE = 2 × 10 5 %, which proves that the device has great muscle augmentation. The noise equivalent power (NEP) represents the minimum incident optical power required for the signal-to-noise ratio (SNR) to reach 1, and is calculated using the following equation: [32] NEP =…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The bandgap of β-(Al x Ga 1– x ) 2 O 3 has been recently studied over the whole range of the alloy composition using various techniques. …”
Section: Introductionmentioning
confidence: 99%
“…Over the last decade, the semiconductor β-Ga 2 O 3 has generated significant interest in the international community due to its ultrawide band gap (4.7–4.9 eV), range of shallow n-type dopants (Si, Sn, Ge), and its ability to be grown from the melt, allowing the production of large-area, cost-effective substrates. , Due to these considerations, β-Ga 2 O 3 is pursued for applications in the power electronics and UV photodetector industries. Bulk growth of β-Ga 2 O 3 has largely been implemented with the edge-defined film-fed growth (EFG) and the Czochralski method. ,, A wide variety of epitaxial growth methods have been implemented to grow high-quality β-Ga 2 O 3 films, including metal-organic chemical vapor deposition (MOCVD), halide vapor phase epitaxy (HVPE), , molecular beam epitaxy (MBE), and pulsed laser deposition (PLD). …”
Section: Introductionmentioning
confidence: 99%