Characterization of deuteriated titanium thin film by residual gas analyzer

Effect of porosity on deuterium retention in titanium thin film

“…At a deuterium filled pressure of 10 −4 mbar, the 35 CF ball valve was closed and the substrate chamber was segregated from the turbo molecular pump followed by filling with deuterium at a pressure of 3 bar and left for 120 h for absorption. Effect of higher pressure and higher duration on quantity of deuterium in titanium thin film was studied earlier [5] and was observed that charging with higher pressure and higher duration leads to higher quantity of deuterium in the titanium thin film.…”

“…Chemical attack was performed at room temperature for 20 min with a quick stirring of the solution [10]. The etched copper substrate was coated with titanium by thermal evaporation method in a vacuum system described in earlier work [5]. Titanium wire of 0.5 mm diameter was heated to its vaporization temperature in a tungsten spiral coil in a vacuum system pumped by turbo molecular pump.…”

“…After coating, the titanium thin films were deuterated in a vacuum system dedicated for vacuum and high pressure applications. Detail description of the vacuum system was published earlier [5]. The vacuum system has two chambers separated by one 35 CF ball valve.…”

“…Required dissociation energy can be provided either by charging the film at higher deuterium pressure or heating the surface. The effect of higher pressure for higher retention of deuterium in titanium thin film is experimentally demonstrated in [5]. Surface morphology plays an important role for absorption of deuterium in the titanium thin film.…”