1991
DOI: 10.12693/aphyspola.80.161
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Characterization of Defect Centres in Semiconductors by Advanced ENDOR Techniques

Abstract: The advanced magnetic resonance techniques and their application to the studies of defects in semiconductors will be reviewed. Transient and stationary ENDOR, opticalły detected ENDOR and doubłe ENDOR variations will be briefly discussed while special attention will be given to the Field-Stepped-ENDOR technique. The successful application of the advanced ENDOR techniques for the structure determination of complex defects will be illustrated by the examples concerning the boron-vacancy complex and thermal donor… Show more

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Cited by 3 publications
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“…The V resides in a Ga substitutional or in a high symmetry interstitial site tetrahedrally surrounded by four nearest As neighbors. The use of advanced ENDOR techniques such as pulsed-and CW-ENDOR optically detected ENDOR and field-stepped ENDOR techniques in the study of boron-vacancy and thermal donors in silicon and the gallium vacancy in gallium phosphide has been reviewed [229]. The use of advanced ENDOR techniques such as pulsed-and CW-ENDOR optically detected ENDOR and field-stepped ENDOR techniques in the study of boron-vacancy and thermal donors in silicon and the gallium vacancy in gallium phosphide has been reviewed [229].…”
Section: Impurity Centers In Semiconductor Host Crystalsmentioning
confidence: 99%
“…The V resides in a Ga substitutional or in a high symmetry interstitial site tetrahedrally surrounded by four nearest As neighbors. The use of advanced ENDOR techniques such as pulsed-and CW-ENDOR optically detected ENDOR and field-stepped ENDOR techniques in the study of boron-vacancy and thermal donors in silicon and the gallium vacancy in gallium phosphide has been reviewed [229]. The use of advanced ENDOR techniques such as pulsed-and CW-ENDOR optically detected ENDOR and field-stepped ENDOR techniques in the study of boron-vacancy and thermal donors in silicon and the gallium vacancy in gallium phosphide has been reviewed [229].…”
Section: Impurity Centers In Semiconductor Host Crystalsmentioning
confidence: 99%