2000
DOI: 10.1016/s0921-5093(99)00782-0
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Characterization and tribological evaluation of MW-PACVD diamond coatings deposited on pure titanium

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Cited by 41 publications
(11 citation statements)
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“…Potential problems associated with the micro-and nanocrystalline diamond films for MEMS applications include high deposition temperatures, low deposition rates, large intrinsic and thermal stresses, poor adhesion to the substrate and a high value of surface roughness [12][13][14]. The development of ultra-nanocrystalline (unc-) diamond technology by Argonne National Laboratory has solved some of these problems [6, [17][18][19].…”
Section: Preparation and Characterization Of Diamond And Dlc Filmsmentioning
confidence: 99%
“…Potential problems associated with the micro-and nanocrystalline diamond films for MEMS applications include high deposition temperatures, low deposition rates, large intrinsic and thermal stresses, poor adhesion to the substrate and a high value of surface roughness [12][13][14]. The development of ultra-nanocrystalline (unc-) diamond technology by Argonne National Laboratory has solved some of these problems [6, [17][18][19].…”
Section: Preparation and Characterization Of Diamond And Dlc Filmsmentioning
confidence: 99%
“…The above phenomenon is mainly because the diamond nucleation can only take place after the formation of a carbide layer on the Ti substrate surface. At the initial stage of deposition, there was competition between the carbide formation and the diamond nucleation [21,22]. Uniform nucleation of the diamond phase was only possible when the C concentration reached the critical concentration of nucleation.…”
Section: Resultsmentioning
confidence: 99%
“…Diamond and DLC can be deposited in the form of thin films using a variety of deposition techniques such as plasma enhanced chemical vapor deposition, plasma assisted chemical vapor deposition, microwave plasma chemical vapor deposition, ion beam deposition, pulsed laser ablations, filtered cathodic arc deposition, magnetron sputtering and DC plasma-jet chemical vapor deposition (Boudina et al 1992;Fu et al 2000;Santra et al 2012). Though the deposition of diamond and DLC include some inherent issues such as high deposition temperature (600-1000°C), large intrinsic and thermal stresses, low deposition rates, poor adhesion to substrate and higher values of surface roughness (Luo et al 2007), yet the use of diamond in high frequency applications (Baliga 1989;Taniuchi et al 2001) and realization of its membranes has been demonstrated (Davidson et al 1999;Kohn et al 1999).…”
Section: Case 2: Maximizing Diaphragm Resonance Frequency (Minimizingmentioning
confidence: 99%