2014 10th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME) 2014
DOI: 10.1109/prime.2014.6872699
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Characterization and modeling of low frequency noise in 0.13 µm BiCMOS SiGe:C heterojunction bipolar trasnsistors

Abstract: Low frequency noise (LFN) in 0.13 µm BiCMOS SiGe:C was characterized both as a function of base current bias IB and emitter area Ae. The LFN exhibits typical behavior of 1/f noise for frequencies up to 1 KHz after which the shot noise 2qI is visible, in transistors with large emitter area (Ae > 1µm 2 ). The 1/f noise is modeled following the SPICE compact model, and the LFN parameters KF and AF were calculated. The extracted figure of merit KB = KF * Ae, has an excellent value of 1.10 −10 µm 2 . The transistor… Show more

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Cited by 2 publications
(4 citation statements)
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“…Data for SiGeC HBTs (■) were treated separatedly as they show a clear improvement over the rest, with (A E ×K F ) avg = 1.25×10 −10 μm², 16.5dB below the range for npn HBT. Data for SiGeC are from [40,64,65,228,229,230]. In left-hand figure, the data are for npn SiGe HBTs from [224] processed in similar conditions ( ), and () from [35] and ( ) from [225] processed at variety of conditions, which resulted in scattering of data.…”
Section: Discussionmentioning
confidence: 99%
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“…Data for SiGeC HBTs (■) were treated separatedly as they show a clear improvement over the rest, with (A E ×K F ) avg = 1.25×10 −10 μm², 16.5dB below the range for npn HBT. Data for SiGeC are from [40,64,65,228,229,230]. In left-hand figure, the data are for npn SiGe HBTs from [224] processed in similar conditions ( ), and () from [35] and ( ) from [225] processed at variety of conditions, which resulted in scattering of data.…”
Section: Discussionmentioning
confidence: 99%
“…Rather, other factors, such as aforementioned bias, layout (especially proximity of trench isolation and polysilicon emitter overlap), SOI, annealing, etc., impact the 1/f noise in HBTs. While overall Ge does not impact the noise in SiGe HBTs, the addition of carbon (C) to the SiGe semiconductor does improves the K F =f×S I B /I B ² in SiGeC HBTs, with (A E ×K F ) avg = 1.25×10 −10 μm², 16.5dB below the range for npn SiGe HBTs (data shown with (■) in Figure 40 and taken from [40,64,65,228,229,230]). Also, as observed in [64], SiGeC HBTs have a much lower noise response compared with the HBTs from other technologies.…”
Section: V11 Observations In Sige Hbtsmentioning
confidence: 99%
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