2008
DOI: 10.1149/1.2903208
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Characteristics of W- and Ti-Doped VO[sub 2] Thin Films Prepared by Sol-Gel Method

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Cited by 57 publications
(27 citation statements)
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“…The dependence of T MI on doping, studied in V 1−x M x O 2 compounds, can be approximately mapped onto its dependence on applied pressure. Reduction of V 4+ is achieved using M = Nb, Mo, W, Ta, Re, Ir, F, Ti, Os, Ru, Tc and so on, with formal charges of +4, +5 or +6 [32,43,[48][49][50][51][52][53][54][55][56][57][58][59]. The effect on T MI is similar to that of negative (compressive) stress along [001] R , yielding dT MI /dx = −0.3 to − 28 K (at.% M) −1 .…”
Section: Discussionmentioning
confidence: 99%
“…The dependence of T MI on doping, studied in V 1−x M x O 2 compounds, can be approximately mapped onto its dependence on applied pressure. Reduction of V 4+ is achieved using M = Nb, Mo, W, Ta, Re, Ir, F, Ti, Os, Ru, Tc and so on, with formal charges of +4, +5 or +6 [32,43,[48][49][50][51][52][53][54][55][56][57][58][59]. The effect on T MI is similar to that of negative (compressive) stress along [001] R , yielding dT MI /dx = −0.3 to − 28 K (at.% M) −1 .…”
Section: Discussionmentioning
confidence: 99%
“…Our thin film of VO 2 is deposited by sol-gel technique on a sapphire substrate as described elsewhere [18]. This technique has been shown to produce VO 2 films with up to four orders of magnitude (10 4 ) change in conductivity across the IMT (see Figure 2b).…”
mentioning
confidence: 99%
“…5 The nature of the metal-insulator transition ͑MIT͒ has been much debated, but recent work indicates a Mott transition. 15 It has been found that a few percent of W can decrease c to 20 to 25°C, i.e., to a comfort temperature suitable for practical fenestration. However, the requirement of a high relative modulation of the transmittance at c has invariably limited T lum to Ͻ40%, which in general is too low.…”
mentioning
confidence: 99%