Characteristics of OH production by O2/H2O pulsed dielectric barrier discharge

The influence of relative humidity on double dielectric barrier discharge plasma for chlorobenzene removal

“…However, it is difficult to detect the emission of OH(A-X) at 308 nm, which has been also reported in other work (Ye et al, 2017). It was probably due to the fact that the quenching of excited OH radicals by oxygen, nitrogen and water molecules is much faster than the de-excitation processes to the ground state (Sun et al, 2005;Yao et al, 2016), making it very difficult to observe OH in the spectra, although it is certainly that OH radicals are present in air/H 2 O plasma discharge. On the other hand, the excited oxygen atoms at transition 5 S 0 / 5 P, 777 nm can be observed in Fig.…”

“…We can learn that the increase of humidity results in a decrease of ozone generation. Water-related species tend to consume atomic O in the following reaction (Yao et al, 2016), leading to a reduction of the atomic O as observed in Fig. 3b.…”

“…It proposed that the spiky current peaks of up to 609 mA presented on the current waveform in Fig. 2a were related to filamentary micro discharge, corresponding to the generation of plasma (Aerts et al, 2013;Yao et al, 2016). Meanwhile, there was no significant difference among discharge current waveforms recorded during a time interval of 17 min (Fig.…”

A Novel Four-Way Plasma-Catalytic Approach for The After-Treatment of Diesel Engine Exhausts

“…According to previous studies, the following routes are possibly responsible for the NOx removal: 40,41 In this study, the production of OH would be the same for the different catalysts as the discharge power was the same. 42 The beneficial effect of CaSO 4 and Au/CaSO 4 on the NOx removal was the increased C x H y O z production as the HC removal was increased by these catalysts. However, the CaSO 4 could also inhibit NOx removal by the prevention of NO 2 to nitrite conversion; a previous study proposed that the acidic nature of sulfates inhibits the adsorption of NO 2 on the alumina support.…”

Mitigating target degradation in sputtering manganite thin films

“…The addition of water vapor appeared to remedy this situation by increasing the amount of available atomic oxygen [13,14] during growth. A valid discussion on the production of OH radicals in the oxygen-water environment [15] is an associated research line but the issue has not been touched in the present paper. Here we show that adding water vapor in a controlled way during growth results in films with proper morphology, structure and transport properties, even when grown with an old and presumably oxygen deficient target.…”