2006
DOI: 10.1016/j.tsf.2005.08.163
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Characteristics of magnetically driven shunting arc plasma for amorphous carbon film deposition

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Cited by 14 publications
(7 citation statements)
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“…In a previous study, a significantly different value of 4 km/s has been reported using an image converter camera. 39) In general, the plasma flow affects the ion saturation current. If the plasma velocity is assumed to be 4 km/s, the maximum error in the obtained ion density is estimated to be 20% at an electron temperature of 4 eV.…”
Section: Spatial Ion Distributionmentioning
confidence: 99%
“…In a previous study, a significantly different value of 4 km/s has been reported using an image converter camera. 39) In general, the plasma flow affects the ion saturation current. If the plasma velocity is assumed to be 4 km/s, the maximum error in the obtained ion density is estimated to be 20% at an electron temperature of 4 eV.…”
Section: Spatial Ion Distributionmentioning
confidence: 99%
“…A shunting arc discharge can be used as an ion source of metals and semi-metal materials, such as titanium, tungsten, silicon, and carbon, and is ignited without any trigger source at a wide range of gas pressures from vacuum to atmospheric pressure under identical discharge conditions [98,115]. The shunting arc is ignited or triggered by self-heating of the rod to increase the vapor pressure and/or to emit thermoelectrons around a rod, as shown in Figure 19.…”
Section: Ion Source For Materials Processmentioning
confidence: 99%
“…C-DLC and S-DLC coatings of 1.2 µm thickness were deposited by Plasma-Based Ion Implantation and Deposition (PBII&D), which is described in detail elsewhere (22)(23) . Figure 2 shows the method used to prepare S-DLC films.…”
Section: Deposition Conditions Of Dlc Filmsmentioning
confidence: 99%