2001
DOI: 10.1016/s0040-6090(01)00969-5
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Characteristics of low pressure plasma arc source ion nitrided layer on austenitic stainless steel at low temperature

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Cited by 37 publications
(24 citation statements)
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“…This etching effect is characteristic of plasma treatments, and it was observed also by other authors on low temperature nitrided austenitic stainless steels [22,23]. As expected, not only grains with different orientation are more or less etched, as observed also by other authors [24], but also the etching deepness depends on the treatment conditions.…”
Section: Discussionsupporting
confidence: 85%
See 1 more Smart Citation
“…This etching effect is characteristic of plasma treatments, and it was observed also by other authors on low temperature nitrided austenitic stainless steels [22,23]. As expected, not only grains with different orientation are more or less etched, as observed also by other authors [24], but also the etching deepness depends on the treatment conditions.…”
Section: Discussionsupporting
confidence: 85%
“…Besides the etching effect, the nitriding treatment causes the occurrence of peculiar surface features, which are characteristic of nitrided austenitic stainless steels irrespectively of the used treatment technique [1,8,22,23,26,27]. The presence of slip steps and reliefs at grain boundaries may be ascribed to the high internal stresses induced by the large amount of solubilised nitrogen, which can produce local plastic deformations.…”
Section: Discussionmentioning
confidence: 99%
“…This will create a compressive stresses on the adjacent grains causing a plastic deformation in the surface [39]. Similar features have been observed elsewhere for nitrided surface [10,40]. Fig.…”
Section: Microstructural Analysissupporting
confidence: 79%
“…Nitriding or carbonitriding of austenitic stainless steels has been carried out as a single treatment technique to improve mainly the room temperature mechanical and tribological properties of austenitic stainless steels [1][2][3][4][5][6][7][8][9][10][11][12]. Single surface treatments have been employed using different plasma techniques such as; radio frequency (rf) plasma [1][2][3][4][5][6], dc glow discharge [7,8], ion implantation [9], low pressure plasma arc source ion nitriding [10], microwave electron cyclotron (ECR) plasma [11], and plasma immersion ion implantation technique [12]. The rf plasma technique has been effectively used to achieve hard and thick nitrided layer in an enormously short plasma processing time of minutes [13].…”
Section: Introductionmentioning
confidence: 99%
“…After the treatments the surface of the samples shows a peculiar morphology (Borgioli et al, 2005(Borgioli et al, , 2006Fossati et al, 2006b;Liang, Xiaolei, & Jiujun, 2001;Singh et al, 2002) ( Figure 1 ). The surface appears plasma etched, which can be ascribed to both the cathodic sputtering and nitriding treatment itself.…”
Section: Morphology and Microstructure Of The Modifi Ed Layersmentioning
confidence: 99%