Characterisation of thin silica films deposited on carbon fibre by an atmospheric pressure non-equilibrium plasma (APNEP)

Chemical vapour deposition enhanced by atmospheric microwave plasmas: a large-scale industrial process or the next nanomanufacturing tool?

“…Different plasma sources can be used, depending on their capability to be scaled-up easily and also on materials to be treated. Dielectric barrier discharges [1,[11][12][13], microwave plasmas [10,14] or dc arcs [15,16] have been tested recently to enhance CVD at atmospheric pressure. Direct plasmas [17][18][19] and post-discharges [4,10,[20][21][22] were tested.…”

Plasmachemical synthesis in low-temperature atmospheric pressure plasma

“…Brown et al [127] described a system for continuous deposition of silicon films (50-400 nm) on carbon fibers. A quartz T-shaped reactor with a top sleeve for continuously feeding carbon fiber and a perpedicular sleeve for connecting a waveguid for MW power (power 2 kW, frequency 2.45 GHz).…”

Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non‐thermal Non‐equilibrium Plasmas

“…One example where these criteria have been achieved is the for continuous deposition of silica coatings onto carbon fibers in a tow form with a low cost, novel atmospheric pressure microwave plasma technique. [59] The objective was to improve the interfacial properties of low modulus carbon fiber composites. A schematic diagram of the experimental setup is shown in Figure 8.…”