Characterisation of Photocathodes Based on Pb Thin Film Deposited by UV Pulsed Laser Ablation

Gontad, F.; Lorusso, A.; Gatti, G.; Ferrario, M.; Passione, Laura Gioia; Persano, Luana; Lovergine, N.; Perrone, A.

doi:10.1016/j.jmst.2013.09.010

Cited by 9 publications

(5 citation statements)

References 18 publications

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“…Another interesting feature of the photoemission performance of the PLD deposited Pb films is that the photoemission is characterized by a single-photon absorption, as previously reported for Pb films deposited with a pulse duration of 7 ns. The QE value obtained for those films (6 Â 10 À5 at 266 nm) is comparable with that obtained in this work [9]. However, the relationship between the collected charge on the anode and the laser energy used for the photoemission process is not perfectly linear; at higher laser energy a parabolic dependence is observed.…”

Section: Resultssupporting

confidence: 87%

“…5(a). The most intense peak, located at 32.28 , can be attributed to the (111) crystalline plane of Pb, as expected [9]. Moreover, the peaks associated with the (200), (220), (311), and (222) crystalline planes of Pb are also observed in the patterns [11].…”

Section: Resultssupporting

confidence: 59%

“…In previous work [6,9], we deposited lead films by PLD in the nanosecond regime at two different wavelengths, 266 and 1064 nm. The films obtained had similar granular structure with some micrometric droplets.…”

Section: Introductionmentioning

confidence: 99%

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Picosecond and subpicosecond pulsed laser deposition of Pb thin films

Gontad

Lorusso

Klini

et al. 2013

Phys. Rev. ST Accel. Beams

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Pb thin films were deposited on Nb substrates by means of pulsed laser deposition (PLD) with UV radiation (248 nm), in two different ablation regimes: picosecond (5 ps) and subpicosecond (0.5 ps). Granular films with grain size on the micron scale have been obtained, with no evidence of large droplet formation. All films presented a polycrystalline character with preferential orientation along the (111) crystalline planes. A maximum quantum efficiency (QE) of 7:3 Â 10 À5 (at 266 nm and 7 ns pulse duration) was measured, after laser cleaning, demonstrating good photoemission performance for Pb thin films deposited by ultrashort PLD. Moreover, Pb thin film photocathodes have maintained their QE for days, providing excellent chemical stability and durability. These results suggest that Pb thin films deposited on Nb by ultrashort PLD are a noteworthy alternative for the fabrication of photocathodes for superconductive radio-frequency electron guns. Finally, a comparison with the characteristics of Pb films prepared by ns PLD is illustrated and discussed.

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Section: Resultssupporting

confidence: 87%

Section: Resultssupporting

confidence: 59%

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Picosecond and subpicosecond pulsed laser deposition of Pb thin films

Gontad

Lorusso

Klini

et al. 2013

Phys. Rev. ST Accel. Beams

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show abstract

“…For example, while semiconductor photocathodes have the advantage of lower work functions and higher quantum efficiencies, metallic photocathodes (Cu, Mg, Y, etc.) are considered as a dependable alternative [7][8][9][10] due to their shorter response time, better robustness, and longer lifetime. Quantum emission measurements of Mg and Y thin film photocathodes revealed a value of 1.8×10-3 for the Mg photocathode and 3.3×10-4 for the Y photocathode [35].…”

Section: Introductionmentioning

confidence: 99%

“…Many techniques have been used for growth of Pb thin films for photocathode applications, such as electroplated deposition, arc deposition, sputtering, evaporation and pulsed laser deposition (PLD) [9][10][11][12][13][14][15][16][17][18][19]. The formation of thin films with different 2 morphology and crystalline structure is of utmost importance for the development in those applications, and there are ongoing experimental investigations into the characterization of these morphologies [7].…”

Section: Introductionmentioning

confidence: 99%

Morphology and structure of Pb thin films grown on Si(111) by pulsed laser deposition

et al. 2020

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Pulsed laser deposition (PLD) is a versatile thin film deposition technique in which high powered laser beam interacts with a target material inside an ultrahigh vacuum chamber. Highly energetic particles such as electrons, atoms, protons, and ions generate a plasma plume that directed towards a substrate material where recondenses form a thin film. PLD is an effective and reliable method to create varieties of thin films such as metal, polymer, and ceramic for many technologically essential applications. In this study, thin Pb films were grown by pulsed laser deposition on Si (111) at various laser fluences, pulse wavelengths, deposition times, and substrate temperatures. Nanosecond pulsed Nd: YAG laser with 1064 nm fundamental wavelength, 10 Hz frequency, and 5 ns pulse duration used to ablate the 99.99% pure Pb material. Scanning electron microscopy (SEM) and ex situ atomic force microscopy (AFM) were used to probe the surface morphology and structure. At room temperature, increasing the laser fluence and/or the pulse wavelength triggers the transformation from the "worm"-like interconnected islands to granular, separated islands. Increasing the substrate temperature to slightly below the Pb melting temperature results in the formation of large, nearly spherical non-wetting islands. Additionally, ultrathin Pb (111) films were grown at room temperature, which resulted in the appearance of a small number of almost 2D islands due vii to the emerging quantum size effect. Our results show that pulsed laser deposition can be used effectively for the controlled growth of Pb thin films.

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Bonding structure and dry etching characteristics in amorphous B–C–N films for hardmask applications

Kim,

Hong

et al. 2024

Carbon

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Characterisation of Photocathodes Based on Pb Thin Film Deposited by UV Pulsed Laser Ablation

Cited by 9 publications

References 18 publications

Picosecond and subpicosecond pulsed laser deposition of Pb thin films

Picosecond and subpicosecond pulsed laser deposition of Pb thin films

Morphology and structure of Pb thin films grown on Si(111) by pulsed laser deposition

Bonding structure and dry etching characteristics in amorphous B–C–N films for hardmask applications

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