Characterisation of electroplated Ni₄₅Fe₅₅ thin films on n-Si (111)

Abstract

Electrodeposition of NiFe films, on hydrogen-terminated n-Si (111)-H from acidic dilute sulphate solution, was studied by electrochemical measurements at room temperature in the presence and absence of saccharin. The electroplating process kinetics was investigated by voltammetric study and the effect of Fe 2+ concentration on the deposit composition was studied as well with energy dispersive spectrometry analysis. The average composition of the Ni 45 Fe 55 film was obtained for Fe 2+ concentration in the range of [0.030-0.035] mol L −1 at a current density of −6 mA cm −2 . Correlation between Fe 2+ concentration in the NiFe deposit and electronic properties was examined by electrochemical impedance spectroscopy. Film roughness depends on Fe 2+ concentration and a smoother deposit was obtained for the Ni 45 Fe 55 film. Very low coercivity (less than 1.3 Oe) was measured in the Ni 45 Fe 55 film with a nominal thickness of 640 nm. The very soft magnetic properties of the NiFe films provide information about the low level of inhomogeneities present in these films.

Magnetooptical response of permalloy multilayer structures on different substrate in the IR–VIS–UV spectral range

“…Furthermore, we can comment that Q(λ) does not depend on interface roughness and it is a bulk parameter. By compiling our result with other reported data [19,52,54,55], the variation of saturation magnetization with Ni concentration in Ni x Fe 1−x alloys is plotted in figure 10(c). Our result falls onto a linear interpolation curve of the literature data, from which one can conclude that the saturation magnetization can be linearly interpolated for any composition of a binary Ni-Fe alloy.…”

Corrosion comparison of free and roller surfaces of Fe70Si8B12Nb10 amorphous ribbon

“…A constant phase element CPE (Q) was used to represent the nonideal capacitance behavior caused by local inhomogeneity. The impedance of CPE is dened as: 29,30…”