1998
DOI: 10.1016/s0022-0248(98)80215-7
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Characterisation of CdO thin films deposited by activated reactive evaporation

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Cited by 81 publications
(18 citation statements)
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“…It is clear that, the prepared films have the <111> preferred orientation. This is in accordance with the reports on CdO films prepared by dc magnetron reactive sputtering [10], dc sputtering [19] and activated reactive evaporation [13,20,21]. It was found that the film preferred orientation depends on the deposition method used; the <120> orientation was reported in the ion beam sputtering [22] and spray pyrolysis films [9].…”
Section: Sample Characterizationsupporting
confidence: 90%
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“…It is clear that, the prepared films have the <111> preferred orientation. This is in accordance with the reports on CdO films prepared by dc magnetron reactive sputtering [10], dc sputtering [19] and activated reactive evaporation [13,20,21]. It was found that the film preferred orientation depends on the deposition method used; the <120> orientation was reported in the ion beam sputtering [22] and spray pyrolysis films [9].…”
Section: Sample Characterizationsupporting
confidence: 90%
“…The XRD shows that the prepared CdO films has a cubic crystal structure with lattice parameter a = 4.69±0.02 Å. This is in agreement with other results [9,10,13]. The average g.s of <111> orientation grains of the studied polycrystalline film annealed at 300 o C is around 50nm, which is about 80% of the constituent oxide, while the average g.s of the CdO film annealed at 400 o C is 137nm.…”
Section: Sample Characterizationsupporting
confidence: 89%
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“…The decreasing absorption edge shows the band gap at the time of annealing represented by hitch shift at the highest wavelength. The films are prepared by activation reactive evaporation method [31] and thermal evaporation method [32], shift on CdO was also observed. During annealing a reduction in band gap has also been observed for electrodeposited ZnO films from an aqueous bath [33].…”
Section: Results and Analysismentioning
confidence: 99%
“…Varieties of methods like dc reactive sputtering [Subramanyamet al, 2001], chemical bath deposition [Ocampoet al, 1994], activated reactive evaporation [K.T. Ramakrishna Reddy et al, 1998], solution growth [Verky and Fort, 1994], thermal oxidation [Ferrer, 1993], sol-gel [Galicia,2000], and spray pyrolysis have been reported in the preparation of SnO2 and ZnO thin films. The electro optical properties of ZnO make this material very convenient as a solar cell material [Ferro et al,2000].…”
Section: Introductionmentioning
confidence: 99%