2019
DOI: 10.1039/c9cp00839j
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Chain length variation to probe the mechanism of accelerator additives in copper electrodeposition

Abstract: We evaluate the effect of chain length for a series of alkyl sulfonic acid additives on Cu electrodeposition by using a combination of electrochemical and Raman spectroscopic methods.

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Cited by 24 publications
(55 citation statements)
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“…In principle, in situ vibrational spectroscopies including Raman, infrared (IR), , and sum-frequency generation (SFG) spectroscopies are able to provide the structural information on adsorbates on Cu electrodes. Among these in situ techniques, SFG merits a unique interfacial specificity, but it depends upon high-performance laser and well-trained professionals with the detectable frequencies limited usually to more than 1000 cm –1 .…”
supporting
confidence: 63%
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“…In principle, in situ vibrational spectroscopies including Raman, infrared (IR), , and sum-frequency generation (SFG) spectroscopies are able to provide the structural information on adsorbates on Cu electrodes. Among these in situ techniques, SFG merits a unique interfacial specificity, but it depends upon high-performance laser and well-trained professionals with the detectable frequencies limited usually to more than 1000 cm –1 .…”
supporting
confidence: 63%
“…In addition, electrochemical SFG results are often too complicated to be explained. Electrochemical surface-enhanced Raman spectroscopy (SERS) merits the low-frequency detection with high surface sensitivity, and it has been used most widely for characterizing the adsorption configurations of additives on a Cu surface. Nevertheless, the oxidation–reduction cycling (ORC) pretreatment of Cu in a chloride-containing solution for the SERS effect may complicate the surface structure and composition . In addition, the local high power density of laser irradiation may cause an unwanted photochemical reaction.…”
mentioning
confidence: 99%
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“…It has been claimed by some authors [ 1 , 7 ] that the formation of very stable complex Cu(I)ClMPS − is responsible for the acceleration of copper deposition. Some more recent studies [ 8 ] showed that sulfonate groups help to partially remove the hydration shell of Cu 2+ that accelerates the reduction of Cu 2+ to Cu + and transfer the latter species to a chloride adlayer. In that way, SPS or MPS acts as an efficient factor for the desolvation step while chloride ions are important for forming Cu–Cl complexes that are reduced to Cu by single electron transfer.…”
Section: Introductionmentioning
confidence: 99%
“…This work aims to evaluate the structure and order of SAM in relation to the polarization of the electrode. We focus on a mixed-component SAM consisting of membrane-anchoring long-chain thiol WC14 and backfiller deuterated 2-mercaptoethanol (ME-D 4 , SH–C2D 2 –C1D 2 –OH), adsorbed on a gold electrode, probed by using in situ electrochemical surface-enhanced Raman spectroscopy (EC-SERS) technique. Usage of isotopically labeled short backfiller molecules allowed us to discriminate between spectroscopic features of ME-D 4 and WC14 and provided the opportunity to track structural alterations induced by the change in bias potential.…”
Section: Introductionmentioning
confidence: 99%