Ceramic coating deposition by electron beam evaporation

Окс, Е. М.; Tyunkov, A.V.; Yushkov, Yu. G.; Zolotukhin, Denis B.

doi:10.1016/j.surfcoat.2017.06.042

Cited by 48 publications

(14 citation statements)

References 12 publications

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“…When observed through the ultrasonic microscope using the sensor we fabricated, a 1-micrometer-thick line appeared clearly. E-beam evaporation is a typical vacuum thin film deposition system of the physical vapor deposi-tion (PVD) method, which is a thin film fabrication method using physical methods, and its schematic diagram appears in Figure S1 [39].…”

Section: Resultsmentioning

confidence: 99%

Development of a High-Resolution Acoustic Sensor Based on ZnO Film Deposited by the RF Magnetron Sputtering Method

2021

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In the study, an acoustic sensor for a high-resolution acoustic microscope was fabricated using zinc oxide (ZnO) piezoelectric ceramics. The c-cut sapphire was processed into a lens shape to deposit a ZnO film using radio frequency (RF) magnetron sputtering, and an upper and a lower electrode were deposited using E-beam evaporation. The electrode was a Au thin film, and a Ti thin film was used as an adhesion layer. The surface microstructure of the ZnO film was observed using a scanning electron microscope (SEM), the thickness of the film was measured using a focused ion beam (FIB) for piezoelectric ceramics deposited on the sapphire wafer, and the thickness of ZnO was measured to be 4.87 μm. As a result of analyzing the crystal growth plane using X-ray diffraction (XRD) analysis, it was confirmed that the piezoelectric characteristics were grown to the (0002) plane. The sensor fabricated in this study had a center frequency of 352 MHz. The bandwidth indicates the range of upper (375 MHz) and lower (328 MHz) frequencies at the −6 dB level of the center frequency. As a result of image analysis using the resolution chart, the resolution was about 1 μm.

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Section: Resultsmentioning

confidence: 99%

Development of a High-Resolution Acoustic Sensor Based on ZnO Film Deposited by the RF Magnetron Sputtering Method

2021

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“…Figure 26 shows a photograph of a cross-section of a ceramic coating on a titanium substrate and the distribution of the elemental composition with the sample depth [135]. The high uniformity of the coatings and the absence of pores are connected with the high migration ability of the coating atoms at a high substrate temperature (over 700 • C) due to radiation heating.…”

Section: Ceramic Coatingsmentioning

confidence: 99%

Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review)

et al. 2022

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This is a review of current developments in the field of ion-plasma and beam methods of synthesis of protective and functional dielectric coatings. We give rationales for attractiveness and prospects of creating such coatings by electron-beam heating and following evaporation of dielectric targets. Forevacuum plasma electron sources, operating at elevated pressure values from units to hundreds of pascals, make it possible to exert the direct action of an electron beam on low-conductive materials. Electron-beam evaporation of aluminum oxide, boron, and silicon carbide targets is used to exemplify the particular features of electron-beam synthesis of such coatings and their parameters and characteristics.

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“…Chemical methods are usually accompanied by chemical reactions and include electroplating, anodic oxidation, electroless plating, chemical vapor deposition and sol‐gel method [1–6]. Physical methods do not involve chemical reactions, for example, evaporation, sputtering, ion beam deposition and laser pulse deposition [7–12]. High‐performance thin films can be applied to the high‐sensitivity electromagnetic field detectors and ultra‐high‐speed switching storage devices.…”

Section: Introductionmentioning

confidence: 99%

Effects of Preparation Methods for Cu Foil on the Electric‐Explosion Properties

Qin

et al. 2021

Propellants Explo Pyrotec

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In order to study the different structural characteristics and electric explosion properties of Cu foils prepared by different methods, Cu films were prepared by electron beam evaporation, electroplating, evaporation, and magnetron sputtering in this work. The morphology and structure of the Cu films were characterized by SEM, AFM, XRD. Furtherly, the Cu films were separately etched into a bridge foil shape to measure the explosion process of the Cu foil in the discharge circuit at the charging voltage of 3000 V, and the resistance and deposition energy were calculated. The results showed that the particle size and surface roughness of Cu foil prepared by evaporation was smallest, and the crystallization peak of Cu (111) texture was strongest. The surface roughness of the Cu foil prepared by magnetron sputtering was the largest, and the peak voltage was the highest of 1640 V. The Cu foil prepared by electroplating had the smallest initial resistance and the longest time to reach the peak resistance during the explosion process. The deposition energy of the Cu film is 93.37 mJ, which is the largest. Among these methods, the Cu foil prepared by electroplating is more conducive to energy conversion.

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Ceramic coating deposition by electron beam evaporation

Cited by 48 publications

References 12 publications

Development of a High-Resolution Acoustic Sensor Based on ZnO Film Deposited by the RF Magnetron Sputtering Method

Development of a High-Resolution Acoustic Sensor Based on ZnO Film Deposited by the RF Magnetron Sputtering Method

Electron-Beam Synthesis of Dielectric Coatings Using Forevacuum Plasma Electron Sources (Review)

Effects of Preparation Methods for Cu Foil on the Electric‐Explosion Properties

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