Centimeter scale color printing with grayscale lithography

Abstract

Structural color from artificial structures, due to its environmental friendliness and excellent durability, represents a route for color printing applications. Among various physical mechanisms, the Fabry-Perot (F-P) cavity effect provides a powerful way to generate vivid colors in either the reflection or transmission direction. Most of the previous F-P type color printing works rely on electron beam grayscale lithography, however, with this technique it is challenging to make large-area and low-cost devices. To circumvent this constraint, we propose to fabricate the F-P type color printing device by the laser grayscale lithography process. The F-P cavity consists of two thin silver films as mirrors and a photoresist film with a spatially variant thickness as the spacer layer. By controlling the laser exposure dose pixel by pixel, a centimeter-scale fullcolor printing device with a spatial resolution up to 5 μm × 5 μm is demonstrated. The proposed large area color printing device may have great potential in practical application areas such as color displays, hyperspectral imaging, advanced painting, and so on.

Advanced manufacturing of dielectric meta-devices

“…In recent years, in addition to the mentioned standard nanolithography techniques such as EBL, FIB, and laser-based lithography, innovative lithography methods have been well developed. These updated methods are based on the combination of EBL, FIB, and LDW, and they include grayscale lithography [217][218][219][220] , multistep lithography [221][222][223][224][225] , and the novel fabrication of scanning probe lithography (SPL) based on the atomic force microscope, which is also studied in dielectric metasurface (d) Mie-resonant silicon-based metasurfaces via single-pulse LIL: Schematic (left) illustrating the four-beam interference setup and the resulting intensity distribution. Mechanism of silicon transformation (middle) utilizing the interference intensity pattern.…”

“…In recent years, in addition to the mentioned standard nanolithography techniques such as EBL, FIB, and laser-based lithography, innovative lithography methods have been well developed. These updated methods are based on the combination of EBL, FIB, and LDW, and they include grayscale lithography [217–220] , multistep lithography [221–225] , and the novel fabrication of scanning probe lithography (SPL) based on the atomic force microscope, which is also studied in dielectric metasurface fabrication [226,227] . These approaches provide avenues for designing and fabricating more intricate nanostructures.…”

Mask-Moving-Lithography-Based High-Precision Surface Fabrication Method for Microlens Arrays

“…As micro/nano structural components with continuous surfaces, fabrication technologies for microlens arrays include laser direct writing [4][5][6], multi-layer etching [7,8], grayscale lithography [9][10][11], 3D printing technology [12][13][14], and mask-moving technologies [15]. Direct writing technology offers a high precision and resolution but is costly and less efficient, so it is unsuitable for mass fabrication or fabrication of large-sized micro-optical elements.…”

Sb2S3-Based Dynamically Tuned Color Filter Array via Genetic Algorithm

“…The inherent loss of plasma in the metal surface plasmon resonance (SPR) significantly limits the saturation and brightness of the resulting structural colors [9]. The Fabry-Perot color filters [10,11], due to their potential for enhancing color purity and gamut, have been the subject of extensive investigations by numerous scholars. Additionally, the use of dielectric nanostructures [12] [15,32,[36][37][38][39][40][41][42][43][44] 573 823 1.7~2 80 × 10 −9 >7000 0.87 0.56 1.55 This paper introduces Sb 2 S 3 as a potential PCM for optical applications.…”