2007
DOI: 10.1088/0953-8984/19/19/196221
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CdS thin films formed on flexible plastic substrates by pulsed-laser deposition

Abstract: The merger of a transparent plastic foil substrate with a semiconductor CdS film for a photonic application was realized using pulsed-laser deposition. Although plastic is not considered to be a favoured substrate material for semiconductor thin-film formation, the deposited CdS film possesses good adhesion, with a polycrystalline texture, flat surface (roughness/thickness = 0.003), and room-temperature photosensitivity with a blue-shifted peak at 2.54 eV. This work demonstrates the capability of pulsed-laser … Show more

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Cited by 32 publications
(18 citation statements)
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References 23 publications
(24 reference statements)
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“…In fact, it is anticipated in the case of nanocrystalline thin films that the domains have a tendency to increase its size near the film surface, thus SEM images representing the surface features of the film, give maximum possible size of grains [17]. On the other hand, crystallite sizes calculated using the XRD data is thickness averaged magnitude, which usually dominated by the smallest crystallites [18]. Similar discrepancy has been reported for various thin films.…”
Section: Resultssupporting
confidence: 53%
“…In fact, it is anticipated in the case of nanocrystalline thin films that the domains have a tendency to increase its size near the film surface, thus SEM images representing the surface features of the film, give maximum possible size of grains [17]. On the other hand, crystallite sizes calculated using the XRD data is thickness averaged magnitude, which usually dominated by the smallest crystallites [18]. Similar discrepancy has been reported for various thin films.…”
Section: Resultssupporting
confidence: 53%
“…The value of R increases with increasing bias voltage V DS . The calculated R is ~163.9 µA/W for V DS = 10 V. Our responsivity value R of epitaxial CdS film is larger than ~1 μA/W measured from ~300 nm thick polycrystalline CdS films with ~8 nm size crystals on plastic substrates [64] or 10 -4 -10 -5 A/W measured from 300 -400 nm thick polycrystalline CdS films with tens nm size crystals on p-GaAs substrate [65]. Note that the R value depends on film texture, incident photon wavelength, contacts, bias voltage, photodetector design and size [66].…”
Section: Cds Filmmentioning
confidence: 57%
“…PLD is in particular well suited for the production of operative optoelectronic/photonic device prototypes such as the GaAson-glass merger and GaAs/Si photodiodes. Low-temperature PLD opens another door of fruitful research: The formation of predominantly amorphous thin films, which reveal quantum-confined features (Acharya et al, 2007). Ongoing work on nanostructured CdS films on flexible polyethylene terephthalate (PET) substrates formed with nanosecond low-temperature PLD is a promising alternative to fragile, rigid device structures.…”
Section: Summery and Future Developmentsmentioning
confidence: 99%