Proceedings of 17th International Workshop on Vertex Detectors — PoS(VERTEX 2008) 2009
DOI: 10.22323/1.068.0036
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CCE studies in silicon

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Cited by 4 publications
(5 citation statements)
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“…Magnetic Czochralski This growth technique results in a high oxygen concentration in the silicon, which was shown to be beneficial in terms of radiation hardness by RD48 3 and RD50 4 . See also [3].…”
Section: Methodsmentioning
confidence: 99%
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“…Magnetic Czochralski This growth technique results in a high oxygen concentration in the silicon, which was shown to be beneficial in terms of radiation hardness by RD48 3 and RD50 4 . See also [3].…”
Section: Methodsmentioning
confidence: 99%
“…These materials are available as n-type (p-in-n) as was used in the current Tracker and as p-type (n-in-p) with electron readout, which shows reduced trapping effects at high irradiation (e.g. [4]).…”
Section: Methodsmentioning
confidence: 99%
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“…N-type wafer substrates present type inversion effects [9] and collect holes, whose mobility is slower than electrons, therefore they are more prone to be trapped. To avoid those effects, the Phase-II upgrade for the ATLAS and CMS experiments use p-type bulk silicon [10,11]. Float Zone or Magnetic Czochralski techniques to fabricate wafer ingots induce different oxygen atom concentrations inside the wafer and show different performance after irradiation.…”
Section: Overview Of Rd50 21 Materials Characterizationmentioning
confidence: 99%
“…Recent results [25] indicate that with a 140 µm thick sensor irradiated with 5 × 10 15 n eq /cm 2 it is possible to collect 12 thousand electrons at 1000 V, roughly 2000 electrons more than a standard 300 µm thick planar sensor.…”
Section: Thin Productionmentioning
confidence: 99%