2012
DOI: 10.1088/1748-0221/7/01/c01110
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Silicon sensor developments for the CMS Tracker upgrade

Abstract: Preparing for the high-luminosity phase of LHC the CMS Tracker collaboration has started a campaign to identify the future planar silicon sensor technology baseline for a new Tracker. A variety of 6 inch wafers have been ordered in different thicknesses and technologies at HPK. Thicknesses ranging from 50 µm to 300 µm are explored on float-zone, magnetic Czochralski and epitaxial material both in n-in-p and pin -n versions. p-stop and p-spray are explored as insulation technology for the n-in-p type sensors as… Show more

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Cited by 19 publications
(26 citation statements)
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“…The radiation environment for the silicon sensors will be a factor of about six higher than the design goal for the currently operated sensors. Therefore the collaborations have been investigating silicon materials and technologies to find more radiation tolerant solutions [6,7,8]. The main outcome was that electron read-out is superior to hole read-out, which is the read-out mode for p-in-n sensors used in the current tracking detectors.…”
Section: Introductionmentioning
confidence: 99%
“…The radiation environment for the silicon sensors will be a factor of about six higher than the design goal for the currently operated sensors. Therefore the collaborations have been investigating silicon materials and technologies to find more radiation tolerant solutions [6,7,8]. The main outcome was that electron read-out is superior to hole read-out, which is the read-out mode for p-in-n sensors used in the current tracking detectors.…”
Section: Introductionmentioning
confidence: 99%
“…In order to find a suitable silicon base material for the upcoming HL-LHC upgrade of the CMS Tracker, the CMS collaboration started a large campaign to investigate the properties of thin, single sided silicon sensors [4]. 164 wafers carrying several different designs have been produced by Hamamatsu Photonics K.K.…”
Section: Cms Tracker Campaignmentioning
confidence: 99%
“…The pixel sensors were diced out from the wafers without any further processing (no under bump metallization or deposition of bumps) since the wafers contained several other structures (strips, test structures, etc.) which were used for Tracker campaign [4]. The electrical characterization (I-V and C-V measurements) of HPK pixel sensors was performed in the laboratory at room temperature.…”
Section: Electrical Characterization 21 IV and Cv Measurementsmentioning
confidence: 99%
“…The standard baby sensors are produced by converting the about 80 µm pitch of the strips to about 45 µm pitch of the read-out chip pads [4]. These mini-strip sensors are used to evaluate radiation hardness of the different materials.…”
Section: The Wafer and Materialsmentioning
confidence: 99%