Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes

Clarke, Gregory; Mishra, Anurag; Kelly, Peter; Bradley, James W.

doi:10.1002/ppap.200931201

Cited by 19 publications

(6 citation statements)

References 19 publications

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“…16 Indeed, Liebig et al 203 have shown using 2D OES that the sputter distribution of the target is wider for an HiPIMS discharge than for dcMS. Similar findings have been reported by Clarke et al 204 This is consistent with empirical observations that show that the width of the ion current density distribution in the target vicinity and thus the erosion width increases with increased target current and voltage, 57 both of which are significantly higher for HiPIMS than for dcMS.…”

Section: Deposition Ratesupporting

confidence: 82%

High power impulse magnetron sputtering discharge

Guðmundsson¹,

Brenning²,

Lundin³

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

623

446

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The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron target in unipolar pulses at low duty cycle and low repetition frequency while keeping the average power about 2 orders of magnitude lower than the peak power. This results in a high plasma density, and high ionization fraction of the sputtered vapor, which allows better control of the film growth by controlling the energy and direction of the deposition species. This is a significant advantage over conventional dc magnetron sputtering where the sputtered vapor consists mainly of neutral species. The HiPIMS discharge is now an established ionized physical vapor deposition technique, which is easily scalable and has been successfully introduced into various industrial applications. The authors give an overview of the development of the HiPIMS discharge, and the underlying mechanisms that dictate the discharge properties. First, an introduction to the magnetron sputtering discharge and its various configurations and modifications is given. Then the development and properties of the high power pulsed power supply are discussed, followed by an overview of the measured plasma parameters in the HiPIMS discharge, the electron energy and density, the ion energy, ion flux and plasma composition, and a discussion on the deposition rate. Finally, some of the models that have been developed to gain understanding of the discharge processes are reviewed, including the phenomenological material pathway model, and the ionization region model.

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Section: Deposition Ratesupporting

confidence: 82%

High power impulse magnetron sputtering discharge

Guðmundsson¹,

Brenning²,

Lundin³

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

623

446

View full text Add to dashboard Cite

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“…where L (= 10 mm) is an assumed mean radial width of the spokes (as used in [12]). The assumption of a Gaussian radial profile fits well observations from previous studies [57]. In the case of the strip probe current density J p (), which is obtained from I p over the narrow strip from the magnetron centre to the outer edge, we ensure that the integral of the constructed function J p (θ, r) over the entire cathode gives the measured discharge current, namely:…”

Section: Inspection Of I P and I Isat Insupporting

confidence: 66%

Triple probe interrogation of spokes in a HiPIMS discharge

Estrin

Karkari

Bradley

2017

J. Phys. D: Appl. Phys.

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Using a triple probe situated above the racetrack and inside the magnetic trap of a magnetron, rotating spokes-like structures have been clearly identified in a single HiPIMS pulse as periodic modulations in the electron temperature T e , electron density n e , ion saturation current I isat , floating potential V f and plasma potential V p. The spokes rotate in the E x B direction with a velocity of ~ 8.8 km/s. Defining the spoke shape from the footprint of ion current they deliver to flush mounted probes embedded in the target, each spoke can be characterised by a dense but cool leading edge (n e ~ 2.0 x 10 19 m-3 , T e ~ 2.1 eV) and relatively hotter but more rarefied trailing edge (n e ~ 1 x 10 19 m-3 , T e ~ 3.9 eV). Measurements of V p show a potential hump towards the rear of spoke, separated from regions of highest density, with plasma potentials up to 8 V more positive than the inter-spoke regions. Azimuthal electric fields of ~1kV/m associated with these structures are calculated.

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“…17,18 Here, n i (t) is assumed to be the total ion density in the plasma at any time t during the impulse, β is the percentage of ions attracted back to the target, and γ is the average secondary electrons emission coefficient of the target. The discharge current I (t) at time t is given by…”

mentioning

confidence: 99%

Discharge current modes of high power impulse magnetron sputtering

Xiao

et al. 2015

AIP Advances

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Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.

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Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes

Cited by 19 publications

References 19 publications

High power impulse magnetron sputtering discharge

High power impulse magnetron sputtering discharge

Triple probe interrogation of spokes in a HiPIMS discharge

Discharge current modes of high power impulse magnetron sputtering

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