GaAs1-xSbx/GaAs heterostructures are promising candidates for intermediate-band solar cells (IBSCs). Ternary compounds such as GaAs1-xSbx facilitate band-gap tuning by introducing an intermediate band between valence and conduction bands. The efficiency of IBSCs can ideally be as high as 63.7% owing to additional photon absorptions related to electron transitions between valence band to intermediate band and intermediate band to conduction band [1]. A major obstacle to achieving high efficiency is the presence of crystallographic defects which act as non-radiative recombination centers. Understanding defect evolution during crystal growth and subsequently minimizing defects by adjusting growth conditions should improve device performance. Defect-free pseudomorphic growth of mismatched materials enabled by molecular beam epitaxy (MBE) is possible up to some critical thickness as the lattice mismatched epilayer is elastically strained to match the substrate lattice. Beyond the critical thickness the accumulated elastic strain is partially relieved by introduction of misfit dislocations. The nature, distribution and density of heteroepitaxial defects are the result of complex interrelated factors such as growth temperature, lattice mismatch, quality of substrate and thickness of epilayer [2]. This study describes the characterization of defect evolution as a function of epilayer thickness in GaAs1-xSbx/GaAs heterostructures grown by MBE using GaAs (001) substrates. The Sb content of the epilayers was measured to be ~8% using high-resolution x-ray diffraction. Cross-sectional TEM samples were prepared using conventional polishing, dimpling and argon ion milling. The milling was carried out at 2.7 keV with samples held at liquid nitrogen temperature in order to minimize any milling damage. A Philips-FEI CM-200 microscope operated at 200 keV was used for imaging. Results are reported for GaAs0.92Sb0.08/GaAs heterostructures with thicknesses in the range of 50 to 4000 nm.