2022
DOI: 10.1109/led.2022.3171112
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Carrier Concentration Analysis in 1.2 kV SiC Schottky Diodes Under Current Crowding

Abstract: Die-level current crowding phenomena are analyzed at the microsecond timescale with an internal IR-Laser Deflection set-up. To this end, the 4H-SiC plasmaoptical coefficient for the refractive index is reported for the first time. A SiC Schottky diode with an edge termination based on a junction termination extension is used as a test vehicle. Under biasing conditions, the edge termination starts a local bipolar conduction along the device active area perimeter, leading to current crowding effects. Using refra… Show more

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Cited by 4 publications
(2 citation statements)
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References 21 publications
(24 reference statements)
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“…Consequently, there is a need for techniques that can provide both time and spatial resolution to detect and monitor the emergence of localized hotspots. These hot spots can result from phenomena like current crowding effects [7]- [11] . In this scenario, surface hot spots typically indicate the location of weak spots projected onto the top metallization of the device.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Consequently, there is a need for techniques that can provide both time and spatial resolution to detect and monitor the emergence of localized hotspots. These hot spots can result from phenomena like current crowding effects [7]- [11] . In this scenario, surface hot spots typically indicate the location of weak spots projected onto the top metallization of the device.…”
Section: Introductionmentioning
confidence: 99%
“…In this scenario, surface hot spots typically indicate the location of weak spots projected onto the top metallization of the device. These weak spots can be attributed to factors such as the device's layout, the packaging technology used to define the device top contacts, or a combination of both [7]- [11]. Detecting hot spots holds a significant potential for studying current crowding, specifically at the top metallization layer.…”
Section: Introductionmentioning
confidence: 99%