Abstract:We have been applying a low discharge voltage (Ca, Mg)O protective layer to plasma display panels to reduce their power consumption. However, (Ca, Mg)O is highly reactive with CO2, and the resulting carbonate formation during high‐temperature panel sealing in air impairs the low discharge voltage characteristic. We investigated the mechanism of the carbonation reaction that occurs on a (Ca, Mg)O surface during annealing in air at 450°C and found that the CO2 diffuses through the formed CaCO3 layer and that a (… Show more
“…The analysis of the depth profiles of photoelectron signals from carbon has revealed that the depth of the presence of carbon from the surface is related to the discharge voltage for a (Ca,Mg)O protective layer with different CaO concentrations. 42) We have directly demonstrated that no carbonation of the (Mg,Ca)O protective layer in the panels occurs at Mg sites, but that it occurs predominantly at Ca sites; the carbonation ratio is clearly related to discharge voltage, even at the same CaO concentration.…”
Section: Resultsmentioning
confidence: 71%
“…The material with the highest potential as a higher-γ protective layer is (Mg,Ca)O. [25][26][27][28][29][30] (Mg,Ca)O is relatively stable compared with the other materials described above because it is MgO-based. Many groups report that low discharge voltages are obtained relative stably with a (Mg,Ca)O protective layer.…”
The carbonation behavior and decarbonation annealing of a protective (Mg,Ca)O layer for flat panel plasma discharge devices were investigated. Compared with a conventional MgO protective layer, the (Mg,Ca)O protective layer showed both high and low discharge voltages. Quantitative X-ray photoelectron spectroscopy analyses indicated that the high discharge voltages were caused by Ca carbonation. The progression of Ca carbonation was enhanced by exposure to air containing H 2 O but not by exposure to dry air. In addition, once (Mg,Ca)O is carbonated, it is impossible to decarbonate Ca by annealing in air at the temperature applied during the production process. We propose the use of annealing in vacuum as an effective method to promote the decarbonation of Ca and maintain a low discharge voltage for plasma discharge devices with (Mg,Ca)O protective layers.
“…The analysis of the depth profiles of photoelectron signals from carbon has revealed that the depth of the presence of carbon from the surface is related to the discharge voltage for a (Ca,Mg)O protective layer with different CaO concentrations. 42) We have directly demonstrated that no carbonation of the (Mg,Ca)O protective layer in the panels occurs at Mg sites, but that it occurs predominantly at Ca sites; the carbonation ratio is clearly related to discharge voltage, even at the same CaO concentration.…”
Section: Resultsmentioning
confidence: 71%
“…The material with the highest potential as a higher-γ protective layer is (Mg,Ca)O. [25][26][27][28][29][30] (Mg,Ca)O is relatively stable compared with the other materials described above because it is MgO-based. Many groups report that low discharge voltages are obtained relative stably with a (Mg,Ca)O protective layer.…”
The carbonation behavior and decarbonation annealing of a protective (Mg,Ca)O layer for flat panel plasma discharge devices were investigated. Compared with a conventional MgO protective layer, the (Mg,Ca)O protective layer showed both high and low discharge voltages. Quantitative X-ray photoelectron spectroscopy analyses indicated that the high discharge voltages were caused by Ca carbonation. The progression of Ca carbonation was enhanced by exposure to air containing H 2 O but not by exposure to dry air. In addition, once (Mg,Ca)O is carbonated, it is impossible to decarbonate Ca by annealing in air at the temperature applied during the production process. We propose the use of annealing in vacuum as an effective method to promote the decarbonation of Ca and maintain a low discharge voltage for plasma discharge devices with (Mg,Ca)O protective layers.
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