Capacitive Radio Frequency Discharge Plasma Containing Negative Ions

Amemiya, Hiroshi; Yasuda, Noboru

doi:10.1143/jpsj.66.623

Cited by 19 publications

(7 citation statements)

References 39 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…To fit the measured ion current to a theoretical curve, the ionic masses and positive ( T p ) and negative ion ( T n ) temperatures are required. In this approach the accelerating species are assumed to be essentially cold with kT p / e ≈ kT n / e ≈ 0.15 eV, which is consistent with other studies of electronegative plasmas. , The weighted average positive ion mass m p was taken from Figure of ref to be 211 amu. The average negative ion masses m n for different operating conditions are calculated in section 3 (Figure ).…”

Section: Methodsmentioning

confidence: 95%

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

et al. 2008

View full text Add to dashboard Cite

By use of time and energy-resolved mass spectrometry, negative ions with masses ranging from m/z = 1-287 amu have been observed in the afterglow of a low-pressure (10 mTorr) pulsed acrylic acid polymerizing plasma. The most intense peaks, seen at m/z = 71, 143, 215, and 287, are assigned to the dehydrogenated oligomer of the form [nM-H](-) for n = 1, 2, 3, and 4, respectively. The results strongly suggest that both m/z = 71 and 143 ions are produced in the on period of the pulse cycle (0.1 ms duration), with higher masses m/z = 215 and 287 being produced by neutral ion chemistry in the off period (up to 40 ms in duration). The increase in the intensity of the [3M-H](-) and [4M-H](-) peaks in the off period is accompanied by a rapid fall in the concentration of [M-H]- ions and electrons, the latter decreasing from approximately 10(15) m(-3) to zero within 150 micros. Deep into the afterglow, Langmuir probe measurements show that the charge species only consist of positive and negative ions, present at equal concentrations in excess of approximately 10(14) m(-3) even after 10 ms that is, the plasma is wholly electron free. To describe the growth of large negative ions a number of possible ion-neutral chemical pathways have been postulated, and a calculation of the ambipolar diffusion rates to the walls suggests that, in the off period, the positive and negative ion contribution to the deposition rate is small ( approximately 1%) compared to the net total deposition rate. However, the observations do indicate that it may be necessary to update models of film growth in the pulsed plasma polymerization of acrylic acid to account for negative ions.

show abstract

Section: Methodsmentioning

confidence: 95%

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

et al. 2008

View full text Add to dashboard Cite

show abstract

“…The values of i −s and i es were determined by the double peaks of i p . 5,6) Since i p between 0 < < 2 eV was masked by the NEDF, the low energy region of EEDF from 0 to about 2 eV was ob- The distance between the electrodes was narrow enough to regard the problem as a one-dimensional one, since the radius of the chamber is much larger than L, leading us to ignore the diffusion loss toward the wall. Then the axial variation of plasma was significant.…”

mentioning

confidence: 99%

Spatial Profile Measurements of Charged Particles in Capacitively-Coupled RF (13.56 MHz) Oxygen Discharges

Kaga¹,

Kimura²,

Ohe³

2001

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

The spatial profiles of negatively charged particles were measured in a capacitively-coupled RF oxygen discharge over the pressure range from 0.1 Torr to 0.5 Torr using a Langmuir probe. The measured profile of negative ions was approximated as a parabolic function, while that of the electrons was uniform for the entire discharge except in the sheath. The measured profiles of negative ions and electronegativity were compared with the simplified theoretical model.

show abstract

“…Thus, it is required to realize a higher processing rate to improve the productivity. In order to increase the processing rate, RF hollow-electrode discharge plasmas with various shapes have been proposed [12][13][14][15][16][17].Negative ions, that is, oxygen ions, are also generated in the RF oxygen plasma [18][19][20][21][22][23][24]. The negative ions play important roles in the RF oxygen plasma structure [24].…”

mentioning

confidence: 99%

“…Negative ions, that is, oxygen ions, are also generated in the RF oxygen plasma [18][19][20][21][22][23][24]. The negative ions play important roles in the RF oxygen plasma structure [24]. The presence of the negative ions influences the structure of the plasma…”

mentioning

confidence: 99%

“…potential and of charged particles as well as electron energy distributions (EED). Amemiya et al [23,24] have reported that the low energy part of the EED in a parallel-plate RF capacitive discharge in oxygen is depleted due to the formation of negative ions. The discharge is sustained partially by anisotropic fast electrons originating from the RF oscillating electrode sheath [25][26][27].…”

mentioning

confidence: 99%

See 1 more Smart Citation

Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O₂ mixture gases

Ohtsu¹,

Takasaki²,

Schulze³

2019

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

Oxygen plasma processing [1] is one method in the important techniques for semiconductor device fabrication. Radio frequency (RF) oxygen plasma is widely used for dry ashing of a photoresist [1, 2] and preparation of an oxide film [3], sterilization of medical products [4,5], etc. On the other hand, inductively coupled plasmas [6,7] and microwave plasmas [8,9] were investigated for these applications using oxygen gas. Recently, one process for producing micro electro mechanical systems devices is also treated by the RF oxygen plasma [10,11]. These processes are mainly attained by the reaction due to oxygen atoms dissociated in the oxygen plasma. For the ashing process, conventional RF capacitive plasmas often suffer from low processing rate. Thus, it is required to realize a higher processing rate to improve the productivity. In order to increase the processing rate, RF hollow-electrode discharge plasmas with various shapes have been proposed [12][13][14][15][16][17].Negative ions, that is, oxygen ions, are also generated in the RF oxygen plasma [18][19][20][21][22][23][24]. The negative ions play important roles in the RF oxygen plasma structure [24]. The presence of the negative ions influences the structure of the plasma

show abstract

Capacitive Radio Frequency Discharge Plasma Containing Negative Ions

Cited by 19 publications

References 39 publications

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

Spatial Profile Measurements of Charged Particles in Capacitively-Coupled RF (13.56 MHz) Oxygen Discharges

Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O₂ mixture gases

Contact Info

Product

Resources

About

Capacitive Radio Frequency Discharge Plasma Containing Negative Ions

Cited by 19 publications

References 39 publications

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

Spatial Profile Measurements of Charged Particles in Capacitively-Coupled RF (13.56 MHz) Oxygen Discharges

Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O2 mixture gases

Contact Info

Product

Resources

About

Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O₂ mixture gases