2017
DOI: 10.1080/03610926.2017.1307401
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Capability index-based control chart for monitoring process mean using repetitive sampling

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Cited by 21 publications
(7 citation statements)
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“…Repetitive sampling plans based on one-sided specifications limits were presented by Yen et al [17] Recently, Saghir et al [10] developed a repetitive control chart for exponentially weighted moving average (EWMA) statistic using auxiliary information for monitoring process means. During the last few years, repetitive sampling has been explored by many authors including Adeoti and Olaomi [18], Aslam et al [19], Aslam et al [19], Aslam et al [20], Balamurali and Jun [14], Balamurali et al [13], Jun et al [21], Liu and Wu [22], and Radhakrishnan and Sivakumaran [23].…”
Section: Introductionmentioning
confidence: 99%
“…Repetitive sampling plans based on one-sided specifications limits were presented by Yen et al [17] Recently, Saghir et al [10] developed a repetitive control chart for exponentially weighted moving average (EWMA) statistic using auxiliary information for monitoring process means. During the last few years, repetitive sampling has been explored by many authors including Adeoti and Olaomi [18], Aslam et al [19], Aslam et al [19], Aslam et al [20], Balamurali and Jun [14], Balamurali et al [13], Jun et al [21], Liu and Wu [22], and Radhakrishnan and Sivakumaran [23].…”
Section: Introductionmentioning
confidence: 99%
“…However, their approaches was based on the range statistic that losses its statistical efficiency when estimating standard deviation for large sample sizes and inappropriate with non-normal distribution (Montgomery, 2009). Adeoti & Olaomi (2018) proposed a repetitive sampling PCI-based control chart using an unbiased estimator ̂ ̅ for monitoring process stability and process capability where…”
Section: Matter: International Journal Of Science and Technology Issn 2454-5880mentioning
confidence: 99%
“…Example II (real-life data) The measurement of the flow width of the photoresist material applied to a silicon wafer in a hard-bake process used in conjunction with photolithography in semiconductor manufacturing taken from the study of Montgomery (2009) is considered. The first 25 samples with each of five wafers were collected when the process is in-control and the last 20 samples were collected when the process shifts has occur resulting in an out-of-control situation (Adeoti and Olaomi, 2018).…”
Section: Illustrative Examplesmentioning
confidence: 99%