Camera Imaging Lens Fabrication using Wafer-Scale UV Embossing Process

Abstract

The magnetic anisotropy of low-dimensional Mott systems exhibits unexpected magnetotransport behavior useful for spin-based quantum electronics. Yet, the anisotropy of natural materials is inherently determined by the crystal structure, highly limiting its engineering. We demonstrate the magnetic anisotropy modulation near a digitized dimensional Mott boundary in artificial superlattices composed of a correlated magnetic monolayer SrRuO3 and nonmagnetic SrTiO3. The magnetic anisotropy is initially engineered by modulating the interlayer coupling strength between the magnetic monolayers.Interestingly, when the interlayer coupling strength is maximized, a nearly degenerate state is realized, in which the anisotropic magnetotransport is strongly influenced by both the thermal and magnetic energy scales. Our results offer a new digitized control for magnetic anisotropy in low-dimensional Mott systems, inspiring promising integration of Mottronics and spintronics.

Wafer-Level Hybrid Integration of Complex Micro-Optical Modules

“…Parallel fabrication is especially useful in cases of miniaturized systems because one can obtain a high number of chips from a wafer and in cases where several structural layers have to be aligned to each other. Thus, similar wafer-level concepts were introduced and optimized in recent years for the fabrication of miniaturized cameras [3][4][5]. However, the technological and application potential of wafer-level miniaturized optics is not restricted to miniature camera lenses.…”