2007
DOI: 10.1016/j.diamond.2006.11.043
|View full text |Cite
|
Sign up to set email alerts
|

Calibration of boron concentration in CVD single crystal diamond combining ultralow energy secondary ions mass spectrometry and high resolution X-ray diffraction

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
10
0
1

Year Published

2007
2007
2022
2022

Publication Types

Select...
5
4

Relationship

0
9

Authors

Journals

citations
Cited by 16 publications
(11 citation statements)
references
References 24 publications
0
10
0
1
Order By: Relevance
“…The CUs of this type are planned to be used in the coming experiments at SLAC with 10-35 GeV electron and positron FACET beam [33]. A set of experiments was performed with few GeV positrons at CERN [34] with the CU based on synthetic diamond doped with boron [35]. Other related experiments include investigations of the radiation of sub-GeV electrons in a bent silicon crystal [36] and of the effectiveness of deflection of multi-GeV electrons by a thin Si crystal [37].…”
mentioning
confidence: 99%
“…The CUs of this type are planned to be used in the coming experiments at SLAC with 10-35 GeV electron and positron FACET beam [33]. A set of experiments was performed with few GeV positrons at CERN [34] with the CU based on synthetic diamond doped with boron [35]. Other related experiments include investigations of the radiation of sub-GeV electrons in a bent silicon crystal [36] and of the effectiveness of deflection of multi-GeV electrons by a thin Si crystal [37].…”
mentioning
confidence: 99%
“…Their relative peak intensities related to the valence band to impurity levels (or band for high doping) permit the deduction of the boron doping level. FTIR and CL both allow the determination of the active boron density (or p-type dopant level), while SIMS gives the total density of boron atoms present in the crystal [96]. Thus, these are complementary techniques.…”
Section: Structural Characterization Techniquesmentioning
confidence: 99%
“…Для послойного анализа дельта-слоев требуется сочетание нескольких факторов: высокого разрешения по глубине, высокой элементной чувствительности и большого динамического диапазона регистрируемой концентрации, что не всегда достигается в экспериментах. Решению этих вопросов посвящено большое число работ [8][9][10][11]. Отметим, что указанные методики количественного анализа концентрации атомов примеси [1,2] были разработаны для установок ВИМС с магнитосекторным масс-анализатором фирмы Cameca.…”
Section: поступило в редакцию 17 ноября 2017 гunclassified