C60 ions of 1 MeV are slow but elongate nanoparticles like swift heavy ions of hundreds MeV

Amekura, H.; Narumi, K.; Chiba, Ayano; Hirano, Yoshimi; Yamada, K.; Tsuya, D.; Yamamoto, S.; Okubo, Nariaki; Ishikawa, N.; Saitoh, Yoichi

doi:10.1038/s41598-019-49645-5

Cited by 16 publications

(18 citation statements)

References 35 publications

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“…The track lengths showed some variation with the mean length of 66.3 nm and the standard deviation of 7.9 nm. While many hillocks were observed in quartz (SiO 2 ) crystal irradiated with the same conditions 20 , the hillocks were not observed in the case of c-Si.…”

Section: Resultsmentioning

confidence: 88%

Ion tracks in silicon formed by much lower energy deposition than the track formation threshold

Amekura

Toulemonde

Narumi

et al. 2021

Sci Rep

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Damaged regions of cylindrical shapes called ion tracks, typically in nano-meters wide and tens micro-meters long, are formed along the ion trajectories in many insulators, when high energy ions in the electronic stopping regime are injected. In most cases, the ion tracks were assumed as consequences of dense electronic energy deposition from the high energy ions, except some cases where the synergy effect with the nuclear energy deposition plays an important role. In crystalline Si (c-Si), no tracks have been observed with any monomer ions up to GeV. Tracks are formed in c-Si under 40 MeV fullerene (C60) cluster ion irradiation, which provides much higher energy deposition than monomer ions. The track diameter decreases with decreasing the ion energy until they disappear at an extrapolated value of ~ 17 MeV. However, here we report the track formation of 10 nm in diameter under C60 ion irradiation of 6 MeV, i.e., much lower than the extrapolated threshold. The diameters of 10 nm were comparable to those under 40 MeV C60 irradiation. Furthermore, the tracks formed by 6 MeV C60 irradiation consisted of damaged crystalline, while those formed by 40 MeV C60 irradiation were amorphous. The track formation was observed down to 1 MeV and probably lower with decreasing the track diameters. The track lengths were much shorter than those expected from the drop of Se below the threshold. These track formations at such low energies cannot be explained by the conventional purely electronic energy deposition mechanism, indicating another origin, e.g., the synergy effect between the electronic and nuclear energy depositions, or dual transitions of transient melting and boiling.

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Section: Resultsmentioning

confidence: 88%

Ion tracks in silicon formed by much lower energy deposition than the track formation threshold

Amekura

Toulemonde

Narumi

et al. 2021

Sci Rep

Self Cite

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“…SHI irradiation causes a peculiar shape transformation induced to nanoparticles (NPs) embedded in amorphous SiO 2 matrices. Numerous experiments [1][2][3][4][5][6][7][8][9][10][11][12] have shown that spherical NPs can become elongated in the ion beam direction and evolve into prolate shapes or rods. While intriguing from an application point of view, the shaping process also offers unique insights into the fundamentals of ion-solid interactions.…”

Section: Introductionmentioning

confidence: 99%

Insights into nanoparticle shape transformation by energetic ions using atomistic simulations

Leino¹,

Jantunen²,

Djurabekova³

2022

Preprint

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The shape of metal nanoparticles embedded in dielectric matrices influences the optical properties of the composite material. Swift heavy ion irradiation can induce a controllable shape transformation in gold and other metals embedded in amorphous silicon dioxide, where the particles elongate along the direction of the ion beam. The details of this transformation are not fully understood, but it is presumably related to nanometer-scale phase transitions induced by individual ion impacts. The phenomenon has been reproduced using atomistic simulations, although the time scale limitations and the lack of accurate interatomic models within the metal-silica interface lead unavoidably to severe simplifications.We improve the realism in the simulations with an accurate model for surface adhesion between gold and silica and by simulating the processes in the matrix between impacts. The simulations with correct adhesion show that the nanoparticles can grow in aspect ratio in the molten state even after silicon dioxide solidifies. Moreover, we demonstrate the active role of the matrix: without explicitly modeling processes in the matrix between impacts, the elongation is limited and does not reach significant aspect ratios seen in experiments. These results significantly improve the theoretical understanding of processes developing in embedded nanoparticles under swift heavy ion irradiation. The knowledge brings forward the ion beam technology as a precise tool for shaping of embedded nanostructures for various optical applications.

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“…[ 28–30 ] On the one hand, the size, shape, and distribution of NPs could be tailored through the selected implantation conditions (e.g., ion energies, ion fluences, ion species, incident angles) to meet the requirement of practical applications in terms of high integration and high stability. [ 31 ] On the other hand, strong interaction between embedded NPs and surrounding dielectric environment enables enhanced light‐matter effects in a monolithic platform for photonic applications. [ 30,32–36 ] Particularly, for the systems containing dielectrics embedded with NPs, the optical properties and other functionality of dielectrics could be modified by the LSPR effect, and therefore the substrates could be endowed with new features.…”

Section: Introductionmentioning

confidence: 99%

Near‐Surface Buried Plasmonic Nanoparticles in Glass as Novel Nonlinear Saturable Absorbers for Ultrafast Lasers

Sun

Jia

Nie

et al. 2021

Advanced Optical Materials

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Ultrafast lasers play important roles for scientific research and industrial applications. Saturable absorbers serve as crucial components for ultrafast laser generation. For decades, securing saturable absorbers with superior performance is one of the focuses in the field of advanced laser technology. In this work, the authors fabricate a new saturable absorption mirror (SAM) based on BK7 glass wafer, which is with a buried thin‐layer of silver (Ag) nanoparticles (NPs). The embedded Ag NPs‐based SAM (Ag‐NPs‐SAM) possesses excellent saturable absorption features due to the localized surface plasmon resonance (LSPR) effect of Ag NPs, and outstanding environmental stability owing to the protection of insulating dielectrics. In addition, benefiting from the ultrafast recovery time of Ag NPs, a continuous‐wave mode‐locking operation with the embedded Ag‐NPs‐SAM at 1037 nm is achieved in a Yb:KGW solid‐state laser system, obtaining pulses of a duration as short as 324 fs. The authors work offers a new strategy toward broadband response and high‐stability saturable absorbers for developing advanced ultrafast lasers.

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C60 ions of 1 MeV are slow but elongate nanoparticles like swift heavy ions of hundreds MeV

Cited by 16 publications

References 35 publications

Ion tracks in silicon formed by much lower energy deposition than the track formation threshold

Ion tracks in silicon formed by much lower energy deposition than the track formation threshold

Insights into nanoparticle shape transformation by energetic ions using atomistic simulations

Near‐Surface Buried Plasmonic Nanoparticles in Glass as Novel Nonlinear Saturable Absorbers for Ultrafast Lasers

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