Buried metal grating for vertical fiber-waveguide coupling with high directionality

Lin, Pin Tso; Wu, Che Yao; Lee, Po Tsung

doi:10.1364/iprsn.2012.im4b.6

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2014

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“…Despite the increase on coupling efficiency, these metal grating designs depend on the buffer thickness under the photonic membrane. More recently in 2012 P. Lin presented a design in which the grating efficiency is independent of the buffer layer thickness by means of a photonic band-gap effect [6]. However, the grating groves require being 600 nm thick.…”

Section: Introductionmentioning

confidence: 99%

Efficient metal grating coupler for membrane-based integrated photonics

Calzadilla

Higuera-Rodriguez

Heiss

et al. 2014

Advanced Photonics for Communications

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This paper reports the progress on the fabrication process of highly efficient metal grating couplers for membrane-based integrated circuits, using double side processing technology on bonded samples. This type of gratings comprises a buried SiO 2 /Ag grating of 125nm thickness with a silver layer as metal mirror, and has several advantages over dielectric gratings as metallic gratings are independent from the buffer thickness. We predict a theoretical chip-to-fiber coupling efficiency of 74% and 89% for uniform and apodized gratings respectively, at a wavelength of 1550 nm. Furthermore, the fabrication process can be used for both, SOI and III-V based platforms.

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Section: Introductionmentioning

confidence: 99%